Photothermal Laser Printing of Sub‐Micrometer Crystalline ZnO Structures

Abstract

During light‐driven 3D additive manufacturing, an object represented in digital form is initially translated into a spatial distribution of light intensity (sequentially or in parallel), which then results in a spatial material distribution. To date, this process typically proceeds by photoexcitation of small functional molecules, leading to photochemically induced crosslinking of soft materials. Alternatively, thermal triggers can be employed, yet thermal processes are often slow and provide only low spatial localization. Nevertheless, sub‐micrometer ZnO structures for functional microelectronic devices have recently been laser‐printed. Herein, the photothermal laser‐printing of ZnO is advanced by i) introducing single‐crystalline rather than amorphous sub‐micrometer ZnO shapes that crystallize in the hexagonal ZnO wurtzite structure, ii) employing dimethyl sulfoxide (DMSO) instead of water, enabling higher local process temperatures without micro‐bubble formation, and iii) using substrates tailored for light absorption and heat management, resolving the challenge of light to heat conversion. Finally, the herein‐demonstrated ZnO printing requires no post‐processing and is a cleanroom‐free technique for the fabrication of crystalline semiconductors.