2006
DOI: 10.1088/0953-8984/18/6/013
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Physical and chemical properties of sputter-deposited TaCxNyfilms

Abstract: The structural, electronic, optical, and mechanical properties of stoichiometric TaC(x)N(y = 1-x) were simulated using an ab initio calculation based on density functional theory (DFT) within the generalized gradient approximation. The calculations revealed the theoretical lattice parameter, density of states, refractive index, and elastic constants as a function of carbon and nitrogen content. TaC(x)N(y) films were subsequently produced on Si wafers using unbalanced magnetron sputtering. The structural, optic… Show more

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Cited by 14 publications
(5 citation statements)
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“…Studies of hard coatings indicate that the electronic and mechanical properties of transition metal nitrides (carbides) are generally expected to be significantly modified by the incorporation of carbon (nitrogen) [22][23][24][25][26] . Thus transition metal carbonitrides could be potentially useful hard materials.…”
Section: Development Of New Superhard Materials Is Of Importance Becamentioning
confidence: 99%
“…Studies of hard coatings indicate that the electronic and mechanical properties of transition metal nitrides (carbides) are generally expected to be significantly modified by the incorporation of carbon (nitrogen) [22][23][24][25][26] . Thus transition metal carbonitrides could be potentially useful hard materials.…”
Section: Development Of New Superhard Materials Is Of Importance Becamentioning
confidence: 99%
“…To date, Ta-C-N thin films have only been employed as diffusion barriers between copper and silicon in semiconductor devices 25 . Their use as protective coating with excellent mechanical properties, especially in a highly crystalline constitution, is indeed relatively unexplored 24 , 26 .…”
Section: Introductionmentioning
confidence: 99%
“…In literature, researchers have used VUV-SE to investigate: (a) interband optical properties of crystalline (quartz) and amorphous SiO 2 [11], (b) optical properties of thin silicon oxynitride film with thickness 25-35 nm [12], (c) direct observation of the dielectric properties of cubic SiC from electronic transitions [13], (d) optical and electronic properties of amorphous carbon films [13] and [14], (e) electronic structure of complex oxides such as high k dielectrics [15], [16], [17], [18], [19] and [20], (f) optical properties of binary transition metal (TM) nitrides and carbides [21], (g) optical constants of lithography based films (photoresists, AR coatings, etc.) and Alq 3 thin films for large-area display applications [22] and (h) optical and electronic properties of high refractive index materials such tantalum oxide thin films [23].…”
Section: Introductionmentioning
confidence: 99%