2004
DOI: 10.1143/jjap.43.8007
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Physical and Electrical Characteristics of Physical Vapor-Deposited Tungsten for Bit Line Process

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Cited by 5 publications
(1 citation statement)
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“…This versatile technique can be applied in various fields to enable the deposition of every inorganic material type and even some organic materials. Additionally, because this method induces less resistance than chemical deposition with a tight layer formed by heterogeneous nucleation and growth [ 21 ], mechanical properties such as wear resistance and hardness are improved greatly.…”
Section: Introductionmentioning
confidence: 99%
“…This versatile technique can be applied in various fields to enable the deposition of every inorganic material type and even some organic materials. Additionally, because this method induces less resistance than chemical deposition with a tight layer formed by heterogeneous nucleation and growth [ 21 ], mechanical properties such as wear resistance and hardness are improved greatly.…”
Section: Introductionmentioning
confidence: 99%