Physical and micro-nano-structure properties of chromium nitride coating deposited by RF sputtering using dynamic glancing angle deposition

Jimenez, Mawin J.M.; Antunes, Vinícius Gabriel; Cucatti, S.; Riul, Antonio; Zagonel, Luiz Fernando; Figueroa, Carlos A.; Wisnivesky, D.; Alvarez, F.

doi:10.1016/j.surfcoat.2019.05.023

Cited by 23 publications

(13 citation statements)

References 51 publications

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“…The effect of the DGLAD oscillatory motion is most visible in the base layer of the ±15° and ±20° coatings in the form of multilayer-like nanostructures or corrugated grains, as evidenced in other studies [ 26 , 28 ]. A detailed view of those structures in higher magnification is provided in Figure 3 .…”

Section: Resultssupporting

confidence: 67%

“…Recently, studies indicated that zigzag grain morphologies produced by GLAD present changes in microstructure, such as texture and residual stresses that can also impact its mechanical properties [ 23 , 24 ]. A variation of GLAD in which the substrate is rocked in front of the target during deposition, continuously changing the angle of arrival of the sputtered material, has been proposed and received the designation of Dynamic Glancing Angle Deposition (DGLAD) [ 25 , 26 ]. This technique also produces coatings with nanosculpted grains, in the form of a zig-zag, for instance.…”

Section: Introductionmentioning

confidence: 99%

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On Improving Wear Resistance of Cr-Al-N Coatings Using Dynamic Glancing Angle DC Magnetron Sputtering

et al. 2021

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The development of alternatives for wear protection in surface engineering can be responsible for a significant decrease in energy waste as a large amount of the energy produced in the world is lost due to tribological contact. Dynamic Glancing Angle Deposition has been recently evaluated as a route to produce coatings with improved wear performance. In this technique, the substrate oscillates along with a determined range in front of the sputtering target during the growth of the film. In this study, five oscillatory ranges (0, ±5°, ±10°, ±15°, ±20°) were probed to manufacture nanostructured Cr-Al-N coatings using direct current magnetron sputtering, and their impact was investigated on the grain morphology, phase formation, chemical composition, and performance of the coatings. FEG-SEM revealed the formation of multilayer-like architecture across the grains of the coatings. The deposition rate and hardness improved, and a more than 2-fold decrease in the material loss was observed in a comparison between the stationary-deposited conventional coating and the sample produced under ±10° oscillatory range. This indicated the potential use of this technique in future surface engineering applications.

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Section: Resultssupporting

confidence: 67%

Section: Introductionmentioning

confidence: 99%

On Improving Wear Resistance of Cr-Al-N Coatings Using Dynamic Glancing Angle DC Magnetron Sputtering

et al. 2021

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“…As a result of the oscillatory motion of the substrate during sputtering within the range of +5 • /−5 • and period of 12 s, the columnar grains present a corrugated morphology at the boundaries (as exemplified in brackets in Figure 7). These corrugated zig-zag columnar grains are associated with in-grain misorientation due to differences in the angle of sputtering flux [6,8,35]. Figure 7 displays corrugated structures with periodicity ten-fold smaller, in the order of 30 nm, indicating that even fast oscillatory motions, with period as small as 12 s, are able to create such grain morphology.…”

Section: Coating Morphologymentioning

confidence: 99%

“…[ 5 ]. Recently, a variation of conventional sputtering, namely dynamic glancing angle deposition (DGLAD), has been introduced, with continuous motion of the substrate as the film grows, affecting the angle of incidence of the sputtered material and changing the morphology of grains to a corrugated or undulated format [ 6 , 7 ]. It was reported that such oscillatory motion is capable of producing multilayer-like structures that can be tuned by the period and range of oscillation [ 8 ].…”

Section: Introductionmentioning

confidence: 99%

Nitrogen-Enriched Cr1−xAlxN Multilayer-Like Coatings Manufactured by Dynamic Glancing Angle Direct Current Magnetron Sputtering

et al. 2020

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Multilayer-like CrN and Cr1−xAlxN coatings with different Al contents were deposited onto a stainless steel substrate using dynamic glancing angle deposition direct current magnetron sputtering (DGLAD dcMS) in a N rich atmosphere to understand the role of Al on the growth of the films and mechanical properties of the nitrides with a multilayer architecture. Chemical analysis by means of energy dispersive analysis (EDS) and glow discharge optical emission spectroscopy (GDOES) depth profiling revealed that while CrN samples were close to stoichiometric, the Cr1−xAlxN coatings presented excess N between 70 and 80% at. An expressive change in texture was observed as the CrN coating changed its preferred orientation from (111) to (200) with the addition of Al, followed by a modification in morphology from grains with faceted pyramidal tops in CrN to dome-shaped grains in Cr1−xAlxN coatings. Multilayer-like nanostructures of corrugated grains were produced with a periodicity of approximately 30 nm using dynamic glancing angle deposition. The deposition rate was drastically reduced with an increase of Al, meanwhile, the best mechanical performance was achieved for the coating with a higher content of Al, with hardness up to 27 GPa and a higher value of maximum resistance to plastic deformation.

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“…Moreover, through the stoichiometry adjustment, the magnetoresistance can be kept to a relatively low value. At present, the CrN thin films have been successfully fabricated by RF reactive magnetron sputtering, molecular beam epitaxy, pulsed laser deposition, ion beam assisted deposition and so on [7,8,[14][15][16][17]. As an alternative approach, chemical solution deposition (CSD) can make the precursor film mix at the atomic level.…”

Section: Introductionmentioning

confidence: 99%

Solution Processable CrN Thin Films: Thickness-Dependent Electrical Transport Properties

Hui

Zuo

et al. 2020

Materials

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Thickness is a very important parameter with which to control the microstructures, along with physical properties in transition-metal nitride thin films. In work presented here, CrN films with different thicknesses (from 26 to 130 nm) were grown by chemical solution deposition. The films are pure phase and polycrystalline. Thickness dependence of microstructures and electrical transport behavior were studied. With the increase of films thickness, grain size and nitrogen content are increased, while resistivity, zero-field sensitivity and magnetoresistance are decreased. In the temperature range of 5–350 K, all samples exhibited semiconductor-like properties with dρ/dT < 0. For the range above and below the Néel temperature, the resistivity can be fitted by the thermal activation model and the two-dimensional weak localization (2D-WL) model, respectively. The ultra-low magnetoresistance at a low temperature under high magnetic fields with a large zero-field sensitivity was observed in the CrN thin films. The zero-field sensitivity can be effectively tuned to 10−2 K−1 at 5 K with a magnetoresistance of less than 1% at 2 K under 14 T by reasonably controlling the thickness.

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Physical and micro-nano-structure properties of chromium nitride coating deposited by RF sputtering using dynamic glancing angle deposition

Cited by 23 publications

References 51 publications

On Improving Wear Resistance of Cr-Al-N Coatings Using Dynamic Glancing Angle DC Magnetron Sputtering

On Improving Wear Resistance of Cr-Al-N Coatings Using Dynamic Glancing Angle DC Magnetron Sputtering

Nitrogen-Enriched Cr1−xAlxN Multilayer-Like Coatings Manufactured by Dynamic Glancing Angle Direct Current Magnetron Sputtering

Solution Processable CrN Thin Films: Thickness-Dependent Electrical Transport Properties

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