Physical Processes and Plasma Parameters in a Radio-Frequency Hybrid Plasma System for Thin-Film Production with Ion Assistance

Abstract

The results of the study of the plasma reactor on the combined magnetron discharge and radio-frequency (RF) inductive discharge located in the external magnetic field are presented. Magnetron discharge provides the generation of atoms and ions of the target materials, while the flow of accelerated ions used for the ion assistance is provided by the RF inductive discharge located in an external magnetic field. Approaching the region of resonant absorption of RF power by optimizing the magnitude and configuration of the external magnetic field makes it possible to obtain a uniform within 10% radial distribution of the ion current across the diameter of 150 mm. When the RF power supply power is 1000 W, the ion current density on the substrate can be adjusted in the range of 0.1-3 mA/cm 2. The use of ion assisting results in a fundamental change in the structure and properties of functional coatings, deposited using a magnetron.