1999
DOI: 10.1016/s0925-9635(99)00003-5
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Physical properties of a:DLC films and their dependence on parameters of deposition and type of substrate

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Cited by 13 publications
(6 citation statements)
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“…162 The roughness of DLC films has been shown to depend on the various deposition methods 163,164 and deposition parameters such as ion energy, [165][166][167][168][169][170] gas mixture 163 and bias voltage. 169 Coating roughness is also dependent on substrate material [171][172][173] and the underlying substrate roughness. Increasing the substrate temperature during deposition results in a higher proportion of sp 2 bonding, creating a more graphitic and therefore rougher surface.…”
Section: Film Roughnessmentioning
confidence: 99%
See 1 more Smart Citation
“…162 The roughness of DLC films has been shown to depend on the various deposition methods 163,164 and deposition parameters such as ion energy, [165][166][167][168][169][170] gas mixture 163 and bias voltage. 169 Coating roughness is also dependent on substrate material [171][172][173] and the underlying substrate roughness. Increasing the substrate temperature during deposition results in a higher proportion of sp 2 bonding, creating a more graphitic and therefore rougher surface.…”
Section: Film Roughnessmentioning
confidence: 99%
“…The incorporation of fluorine in DLC films has been investigated [156][157][158][159][160] and found to increase the hydrophobicity of DLC as it has the effect of lowering the surface energy of the resultant film, although films with a high fluorine content suffer by way of increased mechanical instability, resulting in reduced hardness and modulus.…”
mentioning
confidence: 99%
“…To provide conformal treatment of 3D conductive workpieces, higher plasma density (5-10)×10 10 cm −3 and low voltage 0.5-1 kV at high PRR 10-70 kHz were used. In a case of such small pulse amplitude, the pulse width, τ p , has a minor effect on the coating conformity because the sheath almost reaches a steady-state Child extent within just (10)(11)(12)(13)(14)(15)(16)(17)(18)(19)(20)…”
Section: Methodsmentioning
confidence: 99%
“…The film roughness and wettability can be controlled by variation of pulsed bias amplitude and sample temperature. Very smooth DLC films with average roughness of less than 1Å were deposited at optimum process parameters which makes the processing attractive for large-size nanopattern transfer technology [13,14].…”
Section: Pimentioning
confidence: 99%
“…Doubleside coating on polymer web eliminated its rolling-up due to intrinsic stress of DLC film (patent pending) and was used for microspeaker membrane fabrication. Novel interior RF antenna with capacitively coupled electrode we developed for ICP (patent pending), minimizes contamination due to antenna sputtering thus making the processing prospective for more sophisticated applications like surface smoothing [17], formation of DLC antisticking coating on nanoimprint moulds [18], using DLC layer as antiwear nanoimprint template [19], other DLC coatings on big size substrates for micro and nano pattern transfer technology. …”
Section: Methodsmentioning
confidence: 99%