Physical properties of rf magnetron sputter deposited NiO:WO<sub>3</sub>thin films

Usha, K.; Sivakumar, R.; Sanjeeviraja, C.; Ichimura, M.

doi:10.1088/2053-1591/2/1/016401

Cited by 11 publications

(7 citation statements)

References 48 publications

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“…As can be seen from the amount of newly generated bonds, oxidation of the thin films could be used for characterization of their thermal stability (e.g., by applying other heating rates or heating to lower temperatures). The main peaks in the oxidized W layers are at 588, 862 cm -1 [12,17] and are related to W-O. In the boron containing samples, a broad peak about 1300 -1350 cm -1 indicates the presence of BO3 [24].…”

Section: Resultsmentioning

confidence: 99%

FTIR Analysis of Oxidized Tungsten and Tungsten Diboride Nanolayers

GOLDMANE

Avotiņa

Romanova

et al. 2022

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Tungsten (W) and tungsten diboride (WB2) materials can be used to fabricate electron emission layers in field emission microelectronic devices. The characterization and quality assurance of synthesized films is crucial for the good performance of the devices. W and WB2 nanofilms with a thickness of 150 nm and 200 nm were deposited on the Si-SiO2 substrate by the magnetron sputtering technique. The synthesized layers were thermally treated in a thermal analysis device under various gas flow conditions (varying Ar; N2; synthetic air; air with O2, N2, and moisture (further in this text – laboratory air)) and after oxidation, FTIR (Fourier transform infrared spectrometry) spectra were registered. FTIR spectra of the as-deposited layers showed weak peaks related to Si-O and Si-O-Si bonds from the substrate and considered for the analysis of the layers. Several new peaks occur in the spectra of the thermally treated layers. Of the oxidation layers, new peaks related to nanolayers, were observed W-O bonds, it is noticeable that the spectra vary with each other with signal intensity and offsets. In each experimental environment with various gas flow conditions, there were W=O bonds observed, also in every environment except in laboratory air with the flow, B-O bond was detected for about 1300 – 1350 cm-1 range. It was shown that thermal oxidation of W and WB2 layers can be applied for the analysis of W and WB2 layers on SiO2 substrate by forming W and B oxides using treatment in high temperature and detection of their bonds by FTIR.

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Section: Resultsmentioning

confidence: 99%

FTIR Analysis of Oxidized Tungsten and Tungsten Diboride Nanolayers

GOLDMANE

Avotiņa

Romanova

et al. 2022

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Section: Resultsmentioning

confidence: 99%

“…It can be seen from the figure that the refractive index dispersion curve reduces at higher wavelengths and increases at lower wavelengths, which is related to the quality of the relationship between incident photon frequency and plasma frequency. [45] The n value of a thin film is related to the film density. [45] The extinction coefficient (k), considered as an imaginary part, is used to measure the amount of optical losses caused due to the absorption and scattering wave.…”

Section: Optical Propertiesmentioning

confidence: 99%

“…[45] The n value of a thin film is related to the film density. [45] The extinction coefficient (k), considered as an imaginary part, is used to measure the amount of optical losses caused due to the absorption and scattering wave. It grants the information toward the absorption of light present in material medium caused by an inelastic scattering.…”

Section: Optical Propertiesmentioning

confidence: 99%

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Electrochromic Behavior of Vanadium Pentoxide Thin Films Prepared by a Sol–Gel Spin Coating Process

Amala

Vignesh

Geetha

et al. 2021

Physica Status Solidi (a)

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“…The calculated packing density values of Nb 2 O 5 :MoO 3 films deposited at RT, 100, and 200°C are 1.766, 1.508, and 1.440, respectively. It is observed that the packing density of the film decreases with increasing substrate temperature which may be due to the decrease in refractive index [32]. al.…”

Section: Optical Propertiesmentioning

confidence: 99%