2021
DOI: 10.1007/s10904-021-01927-0
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Physical Vapor Deposited [Co:Cd-(dtc)2]/SnO2 Dual Semiconductor Systems: Synthesis, Characterization and Photo-Electrochemistry

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Cited by 12 publications
(6 citation statements)
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“…The slides were cleaned in a series of steps with detergent, DI water, and acetone, separately. The slides were sonicated after each cleaning step 26 . Removal of all the dust particles was ensured through the ultrasonication cleaning step.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The slides were cleaned in a series of steps with detergent, DI water, and acetone, separately. The slides were sonicated after each cleaning step 26 . Removal of all the dust particles was ensured through the ultrasonication cleaning step.…”
Section: Methodsmentioning
confidence: 99%
“…The slides were sonicated after each cleaning step. 26 Removal of all the dust particles was ensured through the ultrasonication cleaning step. The conductive side of the FTO slide was determined by a multimeter.…”
Section: Synthesis Of Ligandmentioning
confidence: 99%
“…For the preparation of GO conjugated complex, the salts were mixed with GO powder previously synthesized by a two-phase procedure. 22 Dropwise addition of the mixture of metal salts was done in the ligand mixture prepared in the previous step.…”
Section: Ligand Synthesismentioning
confidence: 99%
“…Step-wise cleaning of slides was done with detergent, deionized water and acetone along with sonication. 22 Thick pallets (4 mm) were prepared of the metal sulphide complex powder by the aid of a hydraulic press. The e-beam evaporation system contained a vacuum chamber with a crucible, where the pallet was placed.…”
Section: Ligand Synthesismentioning
confidence: 99%
“…When manufacturing various devices, it is often necessary to form SnO 2 -based films. As a rule, such classical methods as dip-coating [28,29], spin-coating [30,31], physical vapor deposition (PVD) [32] and chemical vapor deposition (CVD) [26,33] are used for this purpose. These methods have some disadvantages, including limitations on the accuracy of dosing and targeting upon deposition of the material on the substrate surface, the risk of a gradient across the film thickness, high energy costs and precursor consumption, poor reproducibility, etc.…”
Section: Introductionmentioning
confidence: 99%