1989
DOI: 10.1149/1.2096864
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Pitting of Sputtered Aluminum Alloy Thin Films

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Cited by 82 publications
(44 citation statements)
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“…Corrosion of SS is reported to be sensitive to small additions of elements, e.g., N, S, C and therefore incorporation of elements from processing media, even in very small amounts, is expected to have significant impact on corrosion properties. For instance, sputter deposited pure Al thin films exhibited high pitting potential which was initially attributed to the grain refinement and improved electrochemical homogeneity [237][238][239][240]. However such large influence on pitting corrosion due to these parameters in pure metals like Al seems less likely.…”
Section: Incorporation Of Elements From Processing Mediamentioning
confidence: 99%
“…Corrosion of SS is reported to be sensitive to small additions of elements, e.g., N, S, C and therefore incorporation of elements from processing media, even in very small amounts, is expected to have significant impact on corrosion properties. For instance, sputter deposited pure Al thin films exhibited high pitting potential which was initially attributed to the grain refinement and improved electrochemical homogeneity [237][238][239][240]. However such large influence on pitting corrosion due to these parameters in pure metals like Al seems less likely.…”
Section: Incorporation Of Elements From Processing Mediamentioning
confidence: 99%
“…To date, a number of researchers have demonstrated that the corrosion resistance of sputter deposited Al-M alloys (where M = Cr, Mo, Ti, Nb, W, Mn or Ta) was significantly improved in comparison to that of pure Al [10][11][12][13]. The pitting potential, E pit , of the sputter deposited alloys was ∼900 mV higher than that of pure Al -attributed to the extended solid solubilities of M (due to alloying occurring via the sputtering process), and therefore formation of a passive film enriched in these alloying elements [10][11][12][13].…”
Section: Introductionmentioning
confidence: 99%
“…The pitting potential, E pit , of the sputter deposited alloys was ∼900 mV higher than that of pure Al -attributed to the extended solid solubilities of M (due to alloying occurring via the sputtering process), and therefore formation of a passive film enriched in these alloying elements [10][11][12][13]. A lack of suitable processing techniques for bulk production has hindered the upscaling, let alone industrial application, of alloys previously studied in the form of sputter deposition.…”
Section: Introductionmentioning
confidence: 99%
“…Given that no amorphous Al-Ti alloy has been reported to date [11][12][13], probably Ti atoms in the Al-Mo-Ti alloys act as a barrier to metallic glass formation. Corrosion resistance experiments in simulated body fluids As stated in the Introduction, it is well known that non-equilibrium Al-transition metal alloys are more resistant to chloride-induced pitting corrosion than pure Al [1,2]. Furthermore, previous researches have shown that such alloys prepared by isothermal electrodeposition in chloroaluminate RTILs have almost the same pitting potentials as similar alloys prepared by other non-equilibrium alloying methods such as rapid solidification, ion implantation, and sputter deposition [3].…”
Section: Characterization Of the Electrodepositsmentioning
confidence: 98%
“…Some examples of these "stainless" aluminum alloys that have been prepared to date include Al-V, Al-Nb, Al-Ti, Al-Cr, Al-Mo, and Al-W [1,2]. Because the solute metal must be present in the Al at concentrations greatly exceeding their usual equilibrium solubilities (< 1 atomic percent (a/o)) so as to enhance the corrosion resistance, non-equilibrium alloying methods such as melt spinning, ion implantation, and sputter deposition are required to prepare these materials.…”
Section: Introductionmentioning
confidence: 99%