Planar Slow-Wave Structures for Low-Voltage Millimeter-Band Vacuum Devices (Novel Approach for Fabrication, Numerical and Experimental Measurements)

Starodubov, A. V.; Галушка, В. В.; Torgashov, Roman A.; Serdobintsev, Alexey A.; Pavlov, Anton M.; Torgashov, G.V.; Ryabukho, P. V.; Rozhnev, A. G.; Ryskin, Nikita M.

doi:10.1109/mms.2018.8612075

Cited by 6 publications

(1 citation statement)

References 11 publications

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“…One of the main challenges for the development of amplifiers in millimeter and submillimeter ranges is the fabrication of microsized slow-wave structures which is difficult to implement with conventional technologies. Various microfabrication methods are proposed instead, including lithography-based approaches (LIGA, UV-LIGA, deep reactive ion etching -DRIE), electric discharge machining (EDM), laser ablation, 3D-printing, micro-and nano-CNC-milling [14][15][16][17][18][19][20]. All of these technologies are quite expensive and labour-consuming.…”

Section: Introductionmentioning

confidence: 99%

Study of Resistive Thin-Film Coatings for Application in Millimeter-Band Vacuum Power Amplifiers

Starodubov¹,

Makarkin²,

Serdobintsev³

et al. 2020

PIER C

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The aim of this work is to discuss the possibility of resistive thin-film coatings used for vacuum electron devices. Following a short review, results on radiophysical parameters studies in millimeter-band of such coatings are presented. Resistive Sn-O coatings with varied oxygen content were fabricated on quartz substrates by reactive magnetron sputtering. Morphology and elemental composition of prepared coatings were studied by means of scanning electron microscopy and secondary ion mass spectrometry, while four-probe method was utilized to study the resistivity of those. Dielectric properties were measured in the V-band (50-70 GHz) in free space using vector network analyzer. It was demonstrated that resistivity and the dielectric properties of coating in millimeter-band can be widely varied by controlling coating composition.

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