2013
DOI: 10.1007/s11664-013-2839-x
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Planarization and Processing of Metamorphic Buffer Layers Grown by Hydride Vapor-Phase Epitaxy

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Cited by 2 publications
(1 citation statement)
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“…The use of chemical-mechanical planarization (CMP) with appropriate applied pressure on the MBL cap was found to reduce the cross-hatching height by more than 20 times. 22 A single stage of the QCL structure grown atop an MBL, which had undergone the CMP treatment, did result in electroluminescence (EL) emission near 3.6-μm wavelength from mesa devices tested at 80 K. 21 However, indium enrichment was observed in the MBL cap layer when heated to highregrowth temperatures. An additional wet-chemical etching step introduced after the CMP resolved this issue and provided an epi-appropriate surface for regrowth of strained SL layers.…”
Section: Introductionmentioning
confidence: 99%
“…The use of chemical-mechanical planarization (CMP) with appropriate applied pressure on the MBL cap was found to reduce the cross-hatching height by more than 20 times. 22 A single stage of the QCL structure grown atop an MBL, which had undergone the CMP treatment, did result in electroluminescence (EL) emission near 3.6-μm wavelength from mesa devices tested at 80 K. 21 However, indium enrichment was observed in the MBL cap layer when heated to highregrowth temperatures. An additional wet-chemical etching step introduced after the CMP resolved this issue and provided an epi-appropriate surface for regrowth of strained SL layers.…”
Section: Introductionmentioning
confidence: 99%