2015
DOI: 10.1109/tasc.2014.2365562
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Planarized, Extendible, Multilayer Fabrication Process for Superconducting Electronics

Abstract: We report on technique and results for superconductor electronics fabrication process, featuring customizable number of planarized superconducting layers. The novel technique enhanced yield on stackable vias of our standard planarized process (RIPPLE) by eliminating the need for an additional deposition of aluminum as an etch stop in the metal-via stack. The drawback of the previous approach was the difficulty in processing aluminum using either wet or dry etch mechanisms. Here, we discuss details of the novel… Show more

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Cited by 25 publications
(8 citation statements)
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“…The state-of-the-art system of wiring lines consists of multiple broad-side coupled lines, embedded within oxide layers by applying chemical mechanical polishing so that planarized microstripline layers can be stacked in a vertical direction. Massachusetts Institute of Technology Lincoln Laboratory has demonstrated the process with six superconducting Nb layers for superconducting electronics [98][99][100]. Microphotograph of an Au X-ray absorber.…”
Section: Tes Bilayermentioning
confidence: 99%
“…The state-of-the-art system of wiring lines consists of multiple broad-side coupled lines, embedded within oxide layers by applying chemical mechanical polishing so that planarized microstripline layers can be stacked in a vertical direction. Massachusetts Institute of Technology Lincoln Laboratory has demonstrated the process with six superconducting Nb layers for superconducting electronics [98][99][100]. Microphotograph of an Au X-ray absorber.…”
Section: Tes Bilayermentioning
confidence: 99%
“…We ran the superconductor SPICE simulator, JoSIM [7], to validate the results of pipelined CMOS-SFQ arrays generated by our modified cryo-mem. We assumed Hypres ERSFQ 1.0𝜇𝑚 technology [56] to validate the splitter unit. Figure 13(a) exhibits the latency comparison of a splitter unit with various PTL lengths between our model and JoSIM, while their energy correlation is described in Figure 13(b).…”
Section: Modeling and Validationmentioning
confidence: 99%
“…A promising multilayer Nb process has been under development by a few places, such as Hypres and Massachusetts Institute of Technology Lincoln Laboratory (MIT/LL). [26][27][28] MIT/ LL recently developed a process that supports eight superconducting Nb metal layers for superconducting electronics. It utilizes extreme UV (EUV) lithography to achieve submicron line/space resolution and chemical mechanical polishing (CMP) to ensure all metal layers are deposited on a surface with topography height of less than 40 nm.…”
Section: Progress In the Fabrication Of Large Lxm-style Arraysmentioning
confidence: 99%