1995
DOI: 10.1016/0257-8972(95)08340-5
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Plasma and ion beam surface treatment of polyethylene

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Cited by 82 publications
(44 citation statements)
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“…Weak bonds not attached to the polymer backbone had little effect on the etching rate, while weak bonds attached directly to the chain or in the chain such as hydrogen bonds greatly accelerated removal. Sprang et al [40] and Zeuner et al [41] found that plasma etching rate of a given polymer increased with discharge power. Upon higher energy input, the density of plasma reactive species as well as their acceleration towards the substrate would increase, resulting in more severe etching of the substrate's surface.…”
Section: Surface Etchingmentioning
confidence: 98%
“…Weak bonds not attached to the polymer backbone had little effect on the etching rate, while weak bonds attached directly to the chain or in the chain such as hydrogen bonds greatly accelerated removal. Sprang et al [40] and Zeuner et al [41] found that plasma etching rate of a given polymer increased with discharge power. Upon higher energy input, the density of plasma reactive species as well as their acceleration towards the substrate would increase, resulting in more severe etching of the substrate's surface.…”
Section: Surface Etchingmentioning
confidence: 98%
“…As a result, they have been extensively used in fields ranging from aerospace to microelectronics, optoelectronics, composites and fiber optics. Among these polymeric materials, polyimides are one of the well-known engineering plastics, offering excellent thermal, mechanical, dielectric and optical properties, along with good chemical resistance and high dimensional stability [1][2][3][4][5][6]. They are distinguished from other high-performance polymers by the solubility of their poly(amic acid) precursor form, which can be cast into uniform films and quantitatively converted to polyimide.…”
Section: Introductionmentioning
confidence: 99%
“…The fabrication methods of the nanostructures on polymers have been developed in various ways including semiconductor processes such as a lithography and etch processes, embossing techniques with hot and UV embossing, nanoimprint lithography, soft lithography, and injection molding, and plasma/ion beam processes. Among these techniques, dry plasma/ion beam treatment processes have been developed in order to transform these inexpensive materials into highly valuable products [3,4]. Different plasmas have been used to modify the structural, mechanical, and chemical properties [5][6][7], but the interest has been more focused on Ar ion plasma because Ar is an inert gas and, therefore, does not chemically react with the organic surface.…”
Section: Introductionmentioning
confidence: 99%
“…Also, the ability to fabricate nanostructures using surface treatment is essential in the development of devices that incorporate nanoscale functionality for mechanical, chemical and optical features [1][2][3][4]. The fabrication methods of the nanostructures on polymers have been developed in various ways including semiconductor processes such as a lithography and etch processes, embossing techniques with hot and UV embossing, nanoimprint lithography, soft lithography, and injection molding, and plasma/ion beam processes.…”
Section: Introductionmentioning
confidence: 99%