Plasma-assisted and thermal atomic layer deposition of electrochemically active Li<sub>2</sub>CO<sub>3</sub>

Hornsveld, Norah; Put, Brecht; Kessels, W.M.M.; Vereecken, Philippe M.; Creatore, M.

doi:10.1039/c7ra07722j

Cited by 42 publications

(44 citation statements)

References 36 publications

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“…33 A sputtering procedure was adopted to investigate the stoichiometry of the film. In contrast to our previous XPS studies of Li 2 CO 3 , 34 the stoichiometry of the films did not change during depth profiling. The obtained LiF stoichiometry of the film is 54.4 at% Li, 44.3 at% F, 0.3 at% C and 0.4 at% O.…”

Section: Ald Processcontrasting

confidence: 99%

Atomic layer deposition of LiF using LiN(SiMe₃)₂ and SF₆ plasma

Hornsveld

Kessels

Synowicki

et al. 2021

Phys. Chem. Chem. Phys.

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Section: Ald Processcontrasting

confidence: 99%

Atomic layer deposition of LiF using LiN(SiMe₃)₂ and SF₆ plasma

Hornsveld

Kessels

Synowicki

et al. 2021

Phys. Chem. Chem. Phys.

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“…The calculated ionic conductivity of ITO layer estimated to be 1.43 × 10 −9 S cm −1 from Equation (),

\begin{matrix} σ = \frac{1}{ρ} = \frac{1}{k A} \end{matrix}

where σ is the ionic conductivity, ρ is the resistivity, k is the slope, and A is the active area of 1.05 cm 2 . This value is comparable with some of the lithium containing materials such as Li 2 CO 3 (≈1.0 × 10 −10 S cm −1 ) [ 33 ] and Li 3 PO 4 (≈1.4 × 10 −10 S cm −1 ), [ 34 ] indicating the appreciable ionic conductivity of this ALD ITO thin‐film.…”

Section: Resultssupporting

confidence: 75%

Atomic Layer Deposition of Indium‐Tin‐Oxide as Multifunctional Coatings on V₂O₅ Thin‐Film Model Electrode for Lithium‐Ion Batteries

Zhao

Nisula

Dhara

et al. 2020

Adv Materials Inter

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LIBs that provided an understanding of how ITO works in LIBs. There are three main ways ITO materials have been exploited-i) As an electrode protecting layer: [5] ITO coated on LiMn 2 O 4 (LMO) showed enhancement in the electrochemical performance when compared to pristine LMO. It is believed that the conductive ITO layer can reduce cell polarization, interparticle resistance, and charge-transfer resistance between LMO particles and the electrolyte solution. Furthermore, the ITO layer could suppress Mn dissolution as well. ii) As a current collector: [6] The electronic conductivity of ITO makes it comparable to the commonly used current collector such as Cu, Pt, and TiN. Additionally, oxidation, a major issue for TiN and Cu current collectors, does not occur in ITO as the ions involved are already in the highest oxidation state (In 3+ and Sn 4+). This makes ITO a promising candidate to serve as a current collector especially suitable for potentially high temperature conditions. iii) As an anode: [7] In 2 O 3 and SnO 2 are electrochemically active toward lithium at the potential range of 0-3 V (vs Li + /Li) with high theoretical capacities (In 2 O 3 578 mAh g −1 , SnO 2 782 mAh g −1). Based on this background, it is believed that ITO can also be exploited as a potential anode material for LIBs. Several deposition techniques are reported to obtain ITO thin-films including spray pyrolysis, [8] sol-gel methods, [9] pulsed laser deposition, [10] e-beam evaporation, [11] physical vapor deposition, [12] chemical vapor deposition, [13] and atomic layer deposition (ALD). [14] Among these methods, ALD is a thin-film deposition technique that is based on alternating, self-limiting chemical reactions between gaseous precursors and a solid surface to produce high quality, uniform and conformal coatings even at low growth temperatures. [15] The ALD method enables precise control over the thickness, composition, and structure (such as intermixed or laminated structure) of the films and allows for conformal coatings to be applied on all exposed complex surfaces, such as 3D silicon micropillars, [16] 3D anodic aluminum oxide, [17] aerogel, [18] and mesoporous membranes. [19] The preparation of ITO thinfilms via the ALD method was reported in several previous This work demonstrates the possible usages of indium tin oxide (ITO) thin-films as multifunctional coatings on V 2 O 5 model electrodes for lithium-ion batteries (LIBs). The thin films are produced with the atomic layer deposition (ALD) method via adjusting the ratio of In 2 O 3 and SnO 2 sub-layers to a well-controlled In: Sn contents. The highest conductivity value (7.37 × 10 −4 Ω cm) of as-grown ITO film is obtained from the sample containing 5% SnO 2 of overall ALD cycles. The ITO thin-films are further investigated as multifunctional coatings on ALD V 2 O 5 electrodes for LIBs: At first, dual electronic and ionic conductive protecting properties of ITO layer are explored to attenuate the fading of the battery capacity by improving the cycling stability. Second, the feasi...

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“…AR = aspect ratio. The stability window listed here is based on thermodynamic calculations reported by Richards et al [77] Electrolyte Material LixAlyS 3×10 −7 --Thermal [102] Li3BO3-Li2CO3 2×10 −6 -AR 13 (99%) Ozone [88] Li2CO3 ---Thermal [103] 10 −10 -AR 25 (80%) Thermal [104] 10 −10 -AR 25 (82%) Plasma [104] Towards full 3D thin-film batteries A recent step towards a full 3D TFB was published by Létiche et al, who showed a 3D TiO2 thin-film electrode coated with a Li3PO4 SSE film. [38] The structure and property of this 3D thin-film electrode is shown in Figure 8.…”

Section: Conformal Solid-state Electrolytesmentioning

confidence: 99%

Advances in 3D Thin‐Film Li‐Ion Batteries

Moitzheim

Put

Vereecken

2019

Adv Materials Inter

107

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The status and progress toward solid‐state 3D thin‐film Li‐ion microbatteries is reviewed. Planar thin‐film batteries (TFBs) are commercially available. A major issue with planar TFBs, however, is that the total footprint capacity is limited, as only a relatively small electrode volume is available for energy storage. Coating of the complete battery thin‐film stack, i.e., cathode/solid electrolyte/anode, over a 3D microstructured current collector substrate can provide higher footprint capacity as a result of the surface area enhancement. However, thus far, no 3D TFB with footprint capacity exceeding the limit of ≈250 µAh cm−2 are achieved. The authors provide a status of the individual components: thin‐film cathodes, anodes, and thin‐film solid electrolyte conformally coated over 3D substrates with periodic microstructures. Guidance for designing a 3D TFB with optimum capacity is also provided.

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Plasma-assisted and thermal atomic layer deposition of electrochemically active Li₂CO₃

Abstract: Growth per cycle as a function of process table temperature for both plasma-assisted (squares) and thermal (circles) ALD processes.

Cited by 42 publications

References 36 publications

Atomic layer deposition of LiF using LiN(SiMe₃)₂ and SF₆ plasma

Atomic layer deposition of LiF using LiN(SiMe₃)₂ and SF₆ plasma

Atomic Layer Deposition of Indium‐Tin‐Oxide as Multifunctional Coatings on V₂O₅ Thin‐Film Model Electrode for Lithium‐Ion Batteries

Advances in 3D Thin‐Film Li‐Ion Batteries

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Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3

Abstract: Growth per cycle as a function of process table temperature for both plasma-assisted (squares) and thermal (circles) ALD processes.

Cited by 42 publications

References 36 publications

Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma

Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma

Atomic Layer Deposition of Indium‐Tin‐Oxide as Multifunctional Coatings on V2O5 Thin‐Film Model Electrode for Lithium‐Ion Batteries

Advances in 3D Thin‐Film Li‐Ion Batteries

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Plasma-assisted and thermal atomic layer deposition of electrochemically active Li₂CO₃

Atomic layer deposition of LiF using LiN(SiMe₃)₂ and SF₆ plasma

Atomic layer deposition of LiF using LiN(SiMe₃)₂ and SF₆ plasma

Atomic Layer Deposition of Indium‐Tin‐Oxide as Multifunctional Coatings on V₂O₅ Thin‐Film Model Electrode for Lithium‐Ion Batteries