Plasma assisted approaches toward high quality transferred synthetic graphene for electronics

Abstract

Graphene has received much attention in multiple fields due to its unique physical and electrical properties, especially in the microelectronic application. Nowadays, graphene can be catalytically produced on active substrates by chemical vapor deposition and then transferred to the target substrates. However, the widely used wet transfer technique often causes inevitable structural damage and surface contamination to the synthetic CVD graphene, thus hindering its application in high-performance devices. There have been numerous reviews on graphene growth and transfer techniques. Thus, this review is not intended to be comprehensive; instead, we focus on the advanced plasma treatment, which may play an important role in the quality improvement throughout the growth and transfer of graphene. Promising pathways for future applications are also provided.

Ultra-Low Loading of Iron Oxide and Platinum on CVD-Graphene Composites as Effective Electrode Catalysts for Solid Acid Fuel Cells

“…The effectiveness of the process is dependent on several factors that include the plasma treatment conditions. These conditions include the plasma power, treatment time, gas flow rate, and pressure [78]. The choice of these parameters alters the physiochemical properties of graphene, such as its electrical conductivity, mechanical strength, and chemical reactivity [79][80][81].…”