Plasma-assisted deposition of hard material layers from organometallic precursors

Täschner, Christine; Bartsch, Karl; Leonhardt, André

doi:10.1016/0257-8972(93)90084-2

Cited by 13 publications

(1 citation statement)

References 4 publications

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“…Thermal and PACVD processes were investigated in the paper of Täschner et al [63]. The total pressure of the reactor was fixed at 0.5 kPa (4 Torr) with pulsed D.C. voltage (maximum 600V).…”

Section: D) Multilayer Coatingsmentioning

confidence: 99%

A Review on Titanium Nitride and Titanium Carbide Single and Multilayer Coatings Deposited by Plasma Assisted Chemical Vapor Deposition

Azadi

Rouhaghadam

Ahangarani

2016

IJE

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In this paper, we reviewed researches about the titanium nitride (TiN) and titanium carbide (TiC) single and multilayer coatings. These coatings were deposited by the plasma assisted chemical vapor deposition (PACVD) technique. Plasma-based technologies are used for the processing of thin films and coatings for different applications such as automobile and aerospace parts, computer disc drives, food industry and surgical/medical instruments. We describe the state of the performance of different coating systems and thin film architectures in PACVD suitable for industrial-scale or laboratory applications. Mechanical properties of coatings such as wear resistance, hardness and the scratch resistance, structural characteristics, physical and chemical properties like coatings adhesion into different substrates, wetting behavior and corrosion resistance were studied. Thus, this paper represents a source of information for those who want to familiarize with the status of knowledge in the area of materials science of functional coatings, in particular TiN/TiC coatings that was deposited by a new Plasma-based technologies.

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Section: D) Multilayer Coatingsmentioning

confidence: 99%