Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source

Hua, Yue; Song, Jian; Hao, Zeyu; Ren, Chunsheng

doi:10.1088/2058-6272/aaac79

Cited by 2 publications

(1 citation statement)

References 51 publications

(90 reference statements)

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“…The majority of applications, however, employ low-pressure devices for sustaining stable and uniform ICPs. Two types of ICPs are most often used: cylindrical-and planar-type [3] cylindrical-type ICP configuration employs a coil wrapped around a cylindrical dielectric tube connected to an RF generator via a matching network [4]. Although the theoretical background was elaborated decades ago [5], the theory of such discharges is still a subject of scientific interest [6].…”

Section: Introductionmentioning

confidence: 99%

Power characteristics of multiple inductively coupled RF discharges inside a metallic chamber

Lojen¹,

Zaplotnik²,

Mozetič³

et al. 2021

Plasma Sci. Technol.

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The characteristics of an innovative configuration of multiple radiofrequency (RF) coils immersed in a large metallic chamber are presented. Water-cooled copper coils were mounted within the slits of double-walled glass tubes, which were immersed into a stainless-steel chamber. The coils were connected in parallel to a gamma-type matching network, powered by an RF generator operating at industrial frequency. Adjustable leads enabled optimisation of the line impedances and thus uniformly distributed RF power across the four coils. Transitions from E- to H-mode and vice versa were measured for all coils at various oxygen pressures between 5 and 25 Pa. A uniform plasma was sustained in H-mode at the absorbed power threshold, which increased monotonously with increasing pressure in the metallic chamber. All coils exhibit the same E- to H-mode transition hysteresis and need the same amount of power for transitioning from E- to H-mode. The setup enables maintaining uniform plasma in virtually any number of coils at high power without the risk of arcing and without the dead volume typical for a classical configuration with coils mounted outside the metallic chamber.

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Section: Introductionmentioning

confidence: 99%

Power characteristics of multiple inductively coupled RF discharges inside a metallic chamber

Lojen¹,

Zaplotnik²,

Mozetič³

et al. 2021

Plasma Sci. Technol.

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Experimental investigation of plasma parameters in 13.56 MHz/2 MHz cylindrical inductively coupled plasma

Zhang¹,

Hua²,

Hao³

et al. 2019

Acta Phys. Sin.

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Inductively coupled plasmais widely used in semiconductor and display process because of its desirable characteristics such as high plasma density, simple structure and independently controllable ion energy. The driving frequency is a significant parameter that generates and maintains the plasma. However, the effects of different driving frequencies on the radial distribution of the plasma parameters are hardly investigated. So a large area cylindrical inductively coupled plasma source driven separately by 2 MHz and 13.56 MHz is investigated. In order to perform a comprehensive investigation about the effect of driving frequency, the radially resolved measurements of electron density, electron temperature and density of metastable state atoms for the argon discharge are systematically analyzed by Langmuir double probe and optical emission spectroscopy at various power values and gas pressures. It is found that input power values at high frequency (13.56 MHz) and low frequency (2 MHz) have different effects on plasma parameters. When discharge is driven at high frequency, the electron density increases obviously with the increase of power. However, when discharge is driven at low frequency, the electron temperature increases evidently with the increase of power. This can be explained by calculating the skin depths in high and low frequency discharge. When the discharge is driven at high frequency, the induced electromagnetic field is higher than that at low frequency, and the single electron obtains more energy. It is easier to ionize, so the energy is mainly used to increase the electron density. When the discharge is driven at low frequency, the skin layer is thicker, the number of heated electrons is larger, and the average energy of electrons is increased, so the energy is mainly used to raise the electron temperature. At a gas pressure of 10 Pa, the electron density shows a ‘convex’ distribution and increases with the increase of input power for both the high-frequency and low-frequency discharge. While the distributions of electron temperature are obviously different. When the discharge is driven at high frequency, the electron temperature is relatively flat in the center of the chamber and slightly increases on the edge. When the discharge is driven at low frequency, the electron temperature gradually decreases along the radial position. This is due to the one-step ionization in the high-frequency discharge and the two-step ionization in the low-frequency discharge. In order to prove that the low-frequency discharge is dominated by two-step ionization, the spectral intensities of the argon plasma under the same discharge conditions are diagnosed by optical emission spectroscopy. The number density of metastable states is calculated by the branch ratio method. The results are consistent with the analyses. At a gas pressure of 100 Pa, the electron density increases and then decreases with the increase of radial distance, and the overall distribution shows a " saddle shape” for high frequency and also for low frequency discharge. Although the uniformity of electron density improves with the gas pressure, the uniformity at low frequency is better than that at high frequency. The reason can be attributed to the fact that the skin layer of low frequency is thicker and the heating area is wider.

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Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source

Cited by 2 publications

References 51 publications

Power characteristics of multiple inductively coupled RF discharges inside a metallic chamber

Power characteristics of multiple inductively coupled RF discharges inside a metallic chamber

Experimental investigation of plasma parameters in 13.56 MHz/2 MHz cylindrical inductively coupled plasma

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