Plasma Characteristics of Internal Inductively Coupled Plasma Source with Ferrite Module

Abstract

Electrical and plasma properties of a U-shaped internal inductively coupled plasma (ICP) source with/without a Ni-Zn ferrite module installed above the ICP antenna were investigated. By installing the ferrite module on the antenna, the increase of plasma density and the decrease of plasma potential could be observed. The increase of plasma density was related to the efficient inductive coupling to the plasma by concentrating the induced magnetic field between the antenna and the substrate. At 800 W of ICP power and 20mTorr Ar, a high density plasma on the order of 4.5 0 10 11 /cm 3 could be obtained.