Plasma Copolymerization of Tetrafluoroethylene/Hexamethyldisiloxane  and In Situ Fourier Transform Infrared Spectroscopy of Its Gas Phase

Shirafuji, Tatsuru; Miyazaki, Yasuo; Nakagami, Yuko; Hayashi, Yasuaki; Nishino, Seiji

doi:10.1143/jjap.38.4520

Cited by 41 publications

(28 citation statements)

References 26 publications

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“…The refractive index of the PP-HMDSO film (n ¼ 1.49) is slightly lower than this maximum value, similar to the values measured by Bonnar et al using a variety of preparation conditions and substrates. [26] A similar observation (a nonmonotonic relationship of refractive index) was also reported by Shirafuji et al [42] ( Fig. 9 from Lee and Lee [41] ) for PcoP films of tetrafluoroethylene/HMDSO with no explanation given.…”

supporting

confidence: 82%

PECVD Siloxane and Fluorine‐Based Copolymer Thin Films

Jiang¹,

Eyink²,

Grant³

et al. 2008

Chemical Vapor Deposition

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Plasma copolymerization is utilized to fabricate thin photonic films based on hexamethyldisiloxane (HMDSO, C 6 H 18 Si 2 O) and octafluorocyclobutane (OFCB, C 4 F 8 ). The structure of the plasma copolymerized films is examined by X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR), and the optical properties including refractive index, n, and extinction coefficient, k, are determined by spectroscopic ellipsometry. The refractive indices, which range from 1.38 to 1.54, can be manipulated by adjusting the volume ratio of the two monomers, HMDSO and OFCB, during the polymerization. A nonlinear relationship between the refractive index and extinction coefficient with comonomer feed ratio is observed. A strong initial increase in both n and k as the amount of HMDSO is increased is attributed to significant defluorination of the resultant polymer films coupled with the formation of a C-C rich crosslinked network. Once the network incorporates substantial amounts of Si-C and Si-O bonds, the refractive index starts to decrease slowly due to a lowering of the density. XPS and FTIR results confirm the changes in internal structure consistent with this mechanism.

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supporting

confidence: 82%

PECVD Siloxane and Fluorine‐Based Copolymer Thin Films

Jiang¹,

Eyink²,

Grant³

et al. 2008

Chemical Vapor Deposition

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“…The appearance of some of the products identified in the plasma was rationalized by some authors [52,53] and can be summarized as follows. The initial decomposition of C 2 F 4 leads to the production of •…”

Section: Gas-phase Diagnosticsmentioning

confidence: 97%

Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges

Milella

Palumbo

Favia

et al. 2005

Pure and Applied Chemistry

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Nanostructured polytetrafluoroethylene (PTFE)-like thin films can be deposited, in certain experimental conditions, by modulated discharges fed with tetrafluoroethylene (TFE). These coatings are characterized by a unique morphology consisting of highly twisted micron-long ribbons, which leads to an extremely high water repellency of the surface. In the present work, the diagnostics of the plasma phase is presented, coupled with that of the coating, in order to understand the film growth mechanism in different discharge regimes. When the duty cycle (DC) is increased in modulated C2F4 plasmas, the monomer depletion increases, too, and many recombination reactions take place at progressively higher rates, resulting in the formation of CF4, C2F6, C3F6, C3F8, and C4F10; the formation of powders in the homogeneous phase, however, was never evidenced. The modulation of C2F4 plasmas strongly affects the morphology of the resulting coating, as revealed by atomic force microscopy (AFM), ranging from bumpy to ribbon-like structures. The latter, moreover, are found to be more PTFE-like with respect to the remaining part of the film. In the last part of the paper, a deposition mechanism is proposed, where low radical densities in the plasma and surface migration of the precursors are the keys for the growth of ribbon-like structures

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“…7,8) On the other hand, amorphous fluorinated carbon (a-C:F) films, such as IMDs, which are prepared from several perfluorocarbon (PFC) gases, can be used as low-k materials without pores. [9][10][11][12][13][14][15][16][17][18][19][20][21] As these reports show, a-C:F film deposited by plasma-enhanced CVD (PECVD) generally has a dielectric constant of 2.0 -2.5, which may make it a promising candidate for next generation IMDs.…”

Section: Introductionmentioning

confidence: 99%

Preparation and Characterization of Amorphous Fluorinated Carbon Film Using Low-Global-Warming-Potential Gas, C₄F₆, by Plasma-Enhanced Chemical Vapor Deposition

Watanabe

Shimogaki

2006

Jpn. J. Appl. Phys.

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Low-dielectric-constant amorphous fluorinated carbon (a-C:F) films were prepared using plasma-enhanced chemical vapor deposition (PECVD) from C 4 F 6 (hexafluoro-1,3-butadiene) gas, which is expected to be a substitutional gas owing to its low global warming potential (GWP). Kinetic analysis revealed that the density of C 4 F 6 in plasma has a proportional relation to film growth rate, which suggests that C 4 F 6 is a main deposition precursor. From our previous study, this density affects the C-CF bond ratio in the film. In this study, we studied the effect of C-CF bond ratio on the thermal stability of the films by examining residual film thickness after vacuum annealing. A higher C-CF bond ratio resulted in a higher thermal stability, but the film became leaky after 300 C annealing.

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Plasma Copolymerization of Tetrafluoroethylene/Hexamethyldisiloxane and In Situ Fourier Transform Infrared Spectroscopy of Its Gas Phase

Cited by 41 publications

References 26 publications

PECVD Siloxane and Fluorine‐Based Copolymer Thin Films

PECVD Siloxane and Fluorine‐Based Copolymer Thin Films

Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges

Preparation and Characterization of Amorphous Fluorinated Carbon Film Using Low-Global-Warming-Potential Gas, C₄F₆, by Plasma-Enhanced Chemical Vapor Deposition

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Plasma Copolymerization of Tetrafluoroethylene/Hexamethyldisiloxane and In Situ Fourier Transform Infrared Spectroscopy of Its Gas Phase

Cited by 41 publications

References 26 publications

PECVD Siloxane and Fluorine‐Based Copolymer Thin Films

PECVD Siloxane and Fluorine‐Based Copolymer Thin Films

Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges

Preparation and Characterization of Amorphous Fluorinated Carbon Film Using Low-Global-Warming-Potential Gas, C4F6, by Plasma-Enhanced Chemical Vapor Deposition

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Product

Resources

About

Preparation and Characterization of Amorphous Fluorinated Carbon Film Using Low-Global-Warming-Potential Gas, C₄F₆, by Plasma-Enhanced Chemical Vapor Deposition