Plasma-Deposited Fluorocarbon Coatings on Methylammonium Lead Iodide Perovskite Films

Armenise, Vincenza; Colella, Silvia; Milella, Antonella; Palumbo, Fabio; Fracassi, Francesco; Listorti, Andrea

doi:10.3390/en15134512

Cited by 3 publications

(7 citation statements)

References 55 publications

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“…S9 (ESI †), the TFS-TFMS modified film shows obviously charactered peaks of F 1s at 688.32 eV, S 2p at 168.08 eV and C-F at 292.45 eV relative to the control one, further indicating that TFS-TFMS was indeed deposited on perovskite films. 27,[37][38][39][40] As described in Fig. 3b, the Pb 4f spectrum of the control perovskite film depicted four peaks, where the Pb-I peaks were located at 137.93 eV of 4f 7/2 , and 142.81 eV of 4f 5/2 , and the detrimental Pb 0 peaks were located at 136.41 and 141.33 eV.…”

Section: Resultsmentioning

confidence: 99%

Surface-anchoring fluorinated sulfonate enables efficient and stable perovskite photovoltaics

Yang,

Li,

Cai

et al. 2024

J. Mater. Chem. C

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Section: Resultsmentioning

confidence: 99%

Surface-anchoring fluorinated sulfonate enables efficient and stable perovskite photovoltaics

Yang,

Li,

Cai

et al. 2024

J. Mater. Chem. C

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“…All the UV–vis spectra exhibit the same features, with the absorption onset at about 780 nm, typical of MAPbI 3 perovskite. [ 33 ] The unchanged energy gap values derived from the Tauc plots for the pristine and 30 s plasma‐treated samples are reported in Figure S4, Supporting Information.…”

Section: Resultsmentioning

confidence: 99%

“…The treatment increased the film resistance to moisture, thanks to the hydrophobic character of the fluorinated polymer. [33] Besides the reported literature, which somehow represent a scattered and often contradictory collection of insights, a comprehensive picture on the effect of plasma treatments upon perovskite surfaces has not been drawn, leaving open many interesting research fronts. For these reasons, we investigate the effect of plasma treatments, using Ar, N 2 , H 2 , and O 2 , on the most common and explored MAPbI 3 perovskite layer, in terms of surface morphology and chemistry, as well as modifications of the optoelectronic properties, using experimental characterization and first-principal calculations.…”

Section: Introductionmentioning

confidence: 99%

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Plasma‐Driven Atomic‐Scale Tuning of Metal Halide Perovskite Surfaces: Rationale and Photovoltaic Application

et al. 2023

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The effective defect passivation of metal halide perovskite (MHP) surfaces is a key strategy to simultaneously tackle MHP solar cell performances enhancement and their stability under operative conditions. Plasma‐based dry processing is an established methodology for the modification of materials surfaces as it does not present the disadvantages often associated with wet treatments. This is becoming a fine tool to reach precise atomic‐scale engineering of the MHP surfaces. Herein is reported a comprehensive picture of the interaction between different plasma chemistries and MHP thin films. The impact of Ar, H2, N2, and O2 low‐pressure plasmas on MHP optochemical properties and morphology is correlated with the performance of photovoltaic devices and rationalized by density functional theory calculations. Strong morphological modifications and selective removal of the uppermost methylammonium moieties are deemed responsible for nonradiative surface defects suppression and higher solar cell performances. Ellipsometry and X‐ray photoelectron spectroscopies shine light on the subtle modifications induced by the different plasma environments, paving the way for the more effective engineering of plasma‐based (deposition) processing. Notably, for O2 plasma treatment, deep‐state traps induced by the formation of IO4− species are demonstrated and rationalized, highlighting the challenges in optimizing O2 plasma‐based solutions for MHP‐based devices.

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“…Among these, modifications: functionalization, cross‐linking, and etching are the most important ones. [ 1,2,7 ]…”

Section: Introductionmentioning

confidence: 99%

Plasma‐Based Technologies for Halide Perovskite Photovoltaics

Armenise,

Covella,

Fracassi

et al. 2024

Solar RRL

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Plasma‐based technologies are at the frontier of material processing for several applications, from packaging to agronomy to photovoltaics. These processes allow for a fine‐tuning of material properties by engineering deposition, interaction with the substrate, and final surface characteristics at the atomistic level. As metal halide perovskite (MHP) solar cells enter the path toward commercialization, plasma processing can be seen as a powerful material manipulation tool already settled within industrially relevant procedures. In this perspective, the impact that these methods can have on different aspects of perovskite solar cells technology is envisioned, focusing on the direct interaction between plasma and MHPs. The use of plasma processes is foreseen for the deposition or crystallization of MHPs films, for treating their surface, as well as for the creation of suitable coatings either on top of perovskite layer and/or as encapsulants of the whole solar converting devices.

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Plasma-Deposited Fluorocarbon Coatings on Methylammonium Lead Iodide Perovskite Films

Cited by 3 publications

References 55 publications

Surface-anchoring fluorinated sulfonate enables efficient and stable perovskite photovoltaics

Surface-anchoring fluorinated sulfonate enables efficient and stable perovskite photovoltaics

Plasma‐Driven Atomic‐Scale Tuning of Metal Halide Perovskite Surfaces: Rationale and Photovoltaic Application

Plasma‐Based Technologies for Halide Perovskite Photovoltaics

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