Plasma Deposition of Thermo‐Responsive Thin Films from N‐Vinylcaprolactam

Moreno‐Couranjou, Maryline; Palumbo, Fabio; Sardella, Eloisa; Frache, Gilles; Favia, Pietro; Choquet, Patrick

doi:10.1002/ppap.201400019

Cited by 9 publications

(5 citation statements)

References 33 publications

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“…Likewise, the peaks at m/z 1 061.57, 1 691.83, 1 819.88, detected only in the plasma deposited coating, could be attributed to peptides with an oxidized methionine or tryptophan . MALDI‐TOF‐MS has been already used, though rarely, in the characterization of plasma polymerized films and, at least in one case, of the plasma deposition of a composite coating containing a drug . However at the best of authors' knowledge, it is the first time that this chemical characterization is carried out for plasma embedded proteins.…”

Section: Resultsmentioning

confidence: 99%

Direct Plasma Deposition of Lysozyme-Embedded Bio-Composite Thin Films

Palumbo

Camporeale

Yang

et al. 2015

Plasma Process. Polym.

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Bio-composite coatings, consisting of an organic matrix embedding a bioactive molecule, have been deposited by means of atomizer-assisted atmospheric pressure plasma. Ethylene was chosen as the precursor of the matrix, while the atomizer was fed with a water solution of lysozyme. Coatings chemical composition was investigated by XPS, FTIR and MALDI-TOF spectroscopies, and it has been proved that the one-step inclusion of protein domains in the composite coatings is successful and lysozyme chemical structure is only slightly altered. The amount of embedded lysozyme is as high as 14 mg/cm 2 as evaluated from water release test. Finally, the activity of the plasma-embedded protein is close to that of pure lysozyme as verified against Micrococcus lysodeikticus ATCC 4698 through an agar plate diffusion test.

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Section: Resultsmentioning

confidence: 99%

Direct Plasma Deposition of Lysozyme-Embedded Bio-Composite Thin Films

Palumbo

Camporeale

Yang

et al. 2015

Plasma Process. Polym.

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“…This nonequilibrium feature makes cold plasmas attractive for technological applications because of the possibility of performing high-temperature chemistry under ambient conditions. Cold plasma technologies are used extensively in materials processing for thin-film synthesis, surface functionalization, and sterilization, among others. ,,− …”

Section: Plasma Principlesmentioning

confidence: 99%

Free-Radical-Induced Grafting from Plasma Polymer Surfaces

et al. 2016

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With the advances in science and engineering in the second part of the 20th century, emerging plasma-based technologies continuously find increasing applications in the domain of polymer chemistry, among others. Plasma technologies are predominantly used in two different ways: for the treatment of polymer substrates by a reactive or inert gas aiming at a specific surface functionalization or for the synthesis of a plasma polymer with a unique set of properties from an organic or mixed organic-inorganic precursor. Plasma polymer films (PPFs), often deposited by plasma-enhanced chemical vapor deposition (PECVD), currently attract a great deal of attention. Such films are widely used in various fields for the coating of solid substrates, including membranes, semiconductors, metals, textiles, and polymers, because of a combination of interesting properties such as excellent adhesion, highly cross-linked structures, and the possibility of tuning properties by simply varying the precursor and/or the synthesis parameters. Among the many appealing features of plasma-synthesized and -treated polymers, a highly reactive surface, rich in free radicals arising from deposition/treatment specifics, offers a particular advantage. When handled carefully, these reactive free radicals open doors to the controllable surface functionalization of materials without affecting their bulk properties. The goal of this review is to illustrate the increasing application of plasma-based technologies for tuning the surface properties of polymers, principally through free-radical chemistry.

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“…Up-to-recently, atmospheric-pressure CVD methods struggled to control the polymer thin films’ properties to the same degree as their vacuum counterparts. Plasma-enhanced CVD (PECVD) can efficiently initiate the free-radical polymerization reaction via the energetic species created by the discharge, even under atmospheric conditions, enabling the growth of organic thin films. − Still, PECVD’s discharges yield a wide variety of species, with energies ranging from negligible (i.e., <1 eV) to highly reactive (i.e., >10 eV), that can induce nonspecific reactions leading to the formation of “plasma-polymers” . Mostly based on fragmentation and recombination mechanisms, the plasma-polymerization of monomers induces strong disparities in the plasma-polymer chemistry and overall properties compared to their conventional polymer counterparts …”

Section: Introductionmentioning

confidence: 99%

Thermoresponsive Water-Soluble Polymer Layers and Water-Stable Copolymer Layers Synthesized by Atmospheric Plasma Initiated Chemical Vapor Deposition

Loyer

Combrisson

Omer

et al. 2018

ACS Appl. Mater. Interfaces

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The growth of thermoresponsive layers with the atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD) process is reported for the first time. N-vinyl caprolactam (NVCL) was successfully homopolymerized and copolymerized with ethylene glycol dimethacrylate (EGDMA), yielding water-soluble and water-stable thermoresponsive thin films, respectively. Strong chemical retention and high thermoresponsivity were achieved, highlighting the ability of AP-PiCVD to grow functional conventional homopolymers and copolymers.

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Plasma Deposition of Thermo‐Responsive Thin Films from N‐Vinylcaprolactam

Cited by 9 publications

References 33 publications

Direct Plasma Deposition of Lysozyme-Embedded Bio-Composite Thin Films

Direct Plasma Deposition of Lysozyme-Embedded Bio-Composite Thin Films

Free-Radical-Induced Grafting from Plasma Polymer Surfaces

Thermoresponsive Water-Soluble Polymer Layers and Water-Stable Copolymer Layers Synthesized by Atmospheric Plasma Initiated Chemical Vapor Deposition

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