1995
DOI: 10.1063/1.358708
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Plasma diagnostics in pulsed laser TiN layer deposition

Abstract: Extraction of negative ions from pulsed electronegative capacitively coupled plasmas J. Appl. Phys. 112, 033303 (2012) High electronegativity multi-dipolar electron cyclotron resonance plasma source for etching by negative ions J. Appl. Phys. 111, 083303 (2012) Decreasing high ion energy during transition in pulsed inductively coupled plasmas Appl. Phys. Lett. 100, 044105 (2012) Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity A… Show more

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Cited by 117 publications
(51 citation statements)
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“…The electron number density has been determined by Stark effect [25,27] on the Ti II at 350.49 nm [28] and Na I at 588.99 nm [27] spectral lines. For this estimation, all the other mechanisms contributing to the line broadening have been neglected.…”
Section: Dual-pulse Libs On Metallic Titanium Target In Seawatermentioning
confidence: 99%
“…The electron number density has been determined by Stark effect [25,27] on the Ti II at 350.49 nm [28] and Na I at 588.99 nm [27] spectral lines. For this estimation, all the other mechanisms contributing to the line broadening have been neglected.…”
Section: Dual-pulse Libs On Metallic Titanium Target In Seawatermentioning
confidence: 99%
“…Several works have used one-dimensional spatially-resolved spectroscopy to investigate the spatial gradients of the electron density in the plasma. Measurements resolved along the plasma axis have shown that, at low ambient gas pressures typical of pulsed laser deposition experiments, the electron density shows a monotonic significant decrease as a function of the distance from the target [13,14]. As the ambient gas pressures approaches the atmospheric Spectrochimica Acta Part B 65 (2010) 395-400 pressure, the decrease of the electron density with the axial distance is less pronounced [15].…”
Section: Introductionmentioning
confidence: 96%
“…RPLD is a quite simple and fast process, since elemental target and low-pressure gases are used. RPLD allows a good control of thickness and stoichiometry of deposits, simply varying the number of laser pulses (N) and the gas pressure in the reactor [14]. On the other hand, there is great interest to the materials with high ZT, as it is connected with energetic problem.…”
Section: Introductionmentioning
confidence: 99%