2018
DOI: 10.1364/oe.26.025370
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Plasma dispersion effect based super-resolved imaging in silicon

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Cited by 15 publications
(8 citation statements)
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“…in a double‐pulse configuration. [ 136 ] This technique consists of a pump beam at 532‐nm wavelength for producing a plasma on the surface for shaping a parallel probe beam at 1.55‐µm wavelength. Two probe beam shapes were obtained using this technique.…”
Section: Self‐limited Excitation With Ultrashort Pulsesmentioning
confidence: 99%
“…in a double‐pulse configuration. [ 136 ] This technique consists of a pump beam at 532‐nm wavelength for producing a plasma on the surface for shaping a parallel probe beam at 1.55‐µm wavelength. Two probe beam shapes were obtained using this technique.…”
Section: Self‐limited Excitation With Ultrashort Pulsesmentioning
confidence: 99%
“…Reproduced with permission. [ 69 ] Copyright 2018, Optical Society of America under the terms of the OSA Open Access Publishing Agreement.…”
Section: Silicon Non‐linearity Based Super‐resolved Pump‐probe Imagingmentioning
confidence: 99%
“…To further demonstrate the proposed operation principle we show some experimental results presenting the breaking of the diffraction limit by generating a narrow dip in the center of the probe's beam PSF that can lead also to sub‐wavelength super‐resolved imaging capabilities when performing scanning with the experimentally shaped PSF beam. [ 69 ]…”
Section: Silicon Non‐linearity Based Super‐resolved Pump‐probe Imagingmentioning
confidence: 99%
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“…12). We envision that the demonstrated photothermal nonlinearity assisted label-free imaging modality could be potentially useful for contactless inspection and metrology of silicon ICs or failure analysis of microelectronic circuitry 52 . It is noted that the proposed technique is also applicable for other shapes and sizes of silicon nanostructures supporting anapole modes, not limited to nanodisks ( Supplementary Fig.…”
Section: Ss Rssmentioning
confidence: 99%