2020
DOI: 10.1021/acsami.0c06879
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Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics

Abstract: We report plasma-enhanced atomic layer deposition (ALD) to prepare conformal nickel thin films and nanotubes using nickelocene as a precursor, water as the oxidant agent, and an incycle plasma-enhanced reduction step with hydrogen. The optimized ALD pulse sequence, combined with a post-processing annealing treatment, allowed us to prepare 30 nm-thick metallic Ni layers with a resistivity of 8 μΩ cm at room temperature and good conformality both on the planar substrates and nanotemplates. Thus, we fabricated se… Show more

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Cited by 22 publications
(51 citation statements)
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“…Thereby extrinsic contributions to the peak broadening were less dominant. The spin-wave spectroscopy confirmed the good quality of the PEALD-grown permalloy and its reduced damping compared to PEALD-grown Ni, 48 opening new possibilities for applications in 3D nanomagnonics.…”
Section: Resultsmentioning
confidence: 63%
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“…Thereby extrinsic contributions to the peak broadening were less dominant. The spin-wave spectroscopy confirmed the good quality of the PEALD-grown permalloy and its reduced damping compared to PEALD-grown Ni, 48 opening new possibilities for applications in 3D nanomagnonics.…”
Section: Resultsmentioning
confidence: 63%
“…This value is larger than the one found for low-damping ALD-grown Ni which was 3.9%. 48 We register an anomalous high AMR % value for the NiFe sample prepared with m = 7, and we attribute it to the different morphology and the larger number of holes in the thin film.…”
Section: Resultsmentioning
confidence: 68%
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“…For instance, iron oxide films can be deposited at temperatures ranging from 150 °C to 500 °C by thermal ALD [36][37][38][70][71][72], and by PEALD [73]. Cobalt and nickel films can be deposited at temperatures ranging from 125 °C to 350 °C by thermal ALD [41,[74][75][76][77][78], and PEALD [39,[79][80][81]. However, issues such as precursor decomposition (i.e., CVD growth) and the loss of the characteristic self-limiting component of ALD, have been reported in many of these processes.…”
Section: Cvd Of Fe Co and Nimentioning
confidence: 99%