Plasma Enhanced Chemical Vapor Deposition synthesis of graphene-like structures from plasma state of CO2 gas

Svavil’nyi, M. Ye.; Panarin, V. Ye.; Shkola, A.A.; Nikolenko, A. D.; Strelchuk, V. V.

doi:10.1016/j.carbon.2020.05.057

Cited by 17 publications

(7 citation statements)

References 19 publications

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“…This process can be used to manufacture large quantities of graphene ( Figure 1 ). Several research groups are currently working on the use of CVD to synthesize single-layer graphene and have demonstrated that CVD offers a promising route for the production of defect-free graphene [ 22 , 23 , 24 ]. Several CVD techniques, including thermal and plasma-enhanced techniques, can be used to make graphene [ 23 , 24 ].…”

Section: Production Of Graphenementioning

confidence: 99%

“…Several research groups are currently working on the use of CVD to synthesize single-layer graphene and have demonstrated that CVD offers a promising route for the production of defect-free graphene [ 22 , 23 , 24 ]. Several CVD techniques, including thermal and plasma-enhanced techniques, can be used to make graphene [ 23 , 24 ]. Process costs are an essential aspect of CVD processes, and plasma-enhanced CVD is the most cost-effective process to date [ 24 ].…”

Section: Production Of Graphenementioning

confidence: 99%

“…Several CVD techniques, including thermal and plasma-enhanced techniques, can be used to make graphene [ 23 , 24 ]. Process costs are an essential aspect of CVD processes, and plasma-enhanced CVD is the most cost-effective process to date [ 24 ].…”

Section: Production Of Graphenementioning

confidence: 99%

“…Several studies have been performed to produce graphene flakes with different numbers of layers. Today graphene can be synthesized using top-down [ 5 , 16 , 17 , 18 , 19 , 20 , 21 ] or bottom-up approaches [ 15 , 22 , 23 , 24 , 25 , 26 ]. Top-down approaches include scotch tape exfoliation [ 5 ], liquid-phase exfoliation in different solvents [ 18 ], or chemical synthesis using redox reactions [ 19 , 20 , 21 ], whereas bottom-up approaches include chemical vapor deposition (CVD) [ 22 , 23 , 24 ] and molecular beam epitaxy [ 25 , 26 ].…”

Section: Introductionmentioning

confidence: 99%

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Estimation of Number of Graphene Layers Using Different Methods: A Focused Review

et al. 2021

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Graphene, a two-dimensional nanosheet, is composed of carbon species (sp2 hybridized carbon atoms) and is the center of attention for researchers due to its extraordinary physicochemical (e.g., optical transparency, electrical, thermal conductivity, and mechanical) properties. Graphene can be synthesized using top-down or bottom-up approaches and is used in the electronics and medical (e.g., drug delivery, tissue engineering, biosensors) fields as well as in photovoltaic systems. However, the mass production of graphene and the means of transferring monolayer graphene for commercial purposes are still under investigation. When graphene layers are stacked as flakes, they have substantial impacts on the properties of graphene-based materials, and the layering of graphene obtained using different approaches varies. The determination of number of graphene layers is very important since the properties exhibited by monolayer graphene decrease as the number of graphene layer per flake increases to 5 as few-layer graphene, 10 as multilayer graphene, and more than 10 layers, when it behaves like bulk graphite. Thus, this review summarizes graphene developments and production. In addition, the efficacies of determining the number of graphene layers using various characterization methods (e.g., transmission electron microscopy (TEM), atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectra and mapping, and spin hall effect-based methods) are compared. Among these methods, TEM and Raman spectra were found to be most promising to determine number of graphene layers and their stacking order.

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Section: Production Of Graphenementioning

confidence: 99%

Section: Production Of Graphenementioning

confidence: 99%

Section: Production Of Graphenementioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Estimation of Number of Graphene Layers Using Different Methods: A Focused Review

et al. 2021

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“…oxides, nitrides). Depending on the technical aspects of the process, various modifications of CVD methods are available, such as: vapor phase epitaxy (VPE), used for single crystal film deposition [14]; Plasma-Enhanced CVD (PECVD) or Plasma-Assisted CVD (PACVD), where plasma is used to induce or accelerate the decomposition or reaction factor of a material [15], low-pressure CVD (LPCVD) [16], for processes that do not require vacuum conditions as high as those in VPE; and metal-organic CVD (MOCVD), where the precursor gas is a metal-organic compound [17]. The main advantage of Plasma Assisted-or Plasma-Enhanced Chemical Vapor Deposition (PACVD/PECVD) over thermal CVD is the possibility it affords of reducing the activation temperature of the chemical reactions from above 700 • C, down to 300 − 500 • C.…”

Section: A Chemical Vapor Depositionmentioning

confidence: 99%

High Performance Power Supplies for Plasma Materials Processing

2021

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Integrated circuits, flat panel displays, solar panels, architectural glass, high resolution camera and many other products are landmarks of the 21 st century. All of these different everyday objects have one thing in common -they are manufactured using plasma processing techniques. The aim of this paper is to introduce this silent hero of modern industry, to a broader audience. An evaluation is made of common types of power converters within the scope of plasma processing applications, while the key requirements and future challenges for such power supplies are discussed.INDEX TERMS Plasma applications, plasma materials processing, power conversion, power electronics.

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Effects of Plasma Ions/Radicals on Kinetic Interactions in Nanowall Deposition: A Review

Ishikawa

2024

Adv Eng Mater

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Recent advances in the growth of carbon nanowalls (CNWs) and vertical graphene nanosheets using various plasma‐enhanced chemical vapor deposition methods are reviewed in this paper. Growth methods are classified into hot‐ and cold‐wall reactors equipped with diverse plasma generation systems, and their respective characteristics are summarized, with particular attention to the behavior of reactive species, such as ions and radicals, generated within the plasma. Recent progress in this research domain is outlined for each method, and an organized account of the chemical kinetic phenomena occurring within the plasma is provided. Finally, future perspectives are discussed. Fundamental data are obtained through real‐time in situ measurements of ions and radicals, and the construction of a database from these data offers microscopic insights that significantly enhance processing outcomes for macroscopically controlling the mechanical shapes and chemical properties of CNWs.This article is protected by copyright. All rights reserved.

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Plasma Enhanced Chemical Vapor Deposition synthesis of graphene-like structures from plasma state of CO2 gas

Cited by 17 publications

References 19 publications

Estimation of Number of Graphene Layers Using Different Methods: A Focused Review

Estimation of Number of Graphene Layers Using Different Methods: A Focused Review

High Performance Power Supplies for Plasma Materials Processing

Effects of Plasma Ions/Radicals on Kinetic Interactions in Nanowall Deposition: A Review

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