Plasma-enhanced chemical vapor deposition of nanocrystalline diamond

Abstract

Nanocrystalline diamond films have attracted considerable attention because they have a low coefficient of friction and a low electron emission threshold voltage. In this paper, the author reviews the plasma-enhanced chemical vapor deposition (PE-CVD) of nanocrystalline diamond and mainly focuses on the growth of nanocrystalline diamond by low-pressure PE-CVD. Nanocrystalline diamond particles of 200-700 nm diameter have been prepared in a 13.56 MHz low-pressure inductively coupled CH 4 /CO/H 2 plasma. The bonding state of carbon atoms was investigated by ultraviolet-excited Raman spectroscopy. Electron energy loss spectroscopy identified sp 2 -bonded carbons around the 20-50 nm subgrains of nanocrystalline diamond particles. Plasma diagnostics using a Langmuir probe and the comparison with plasma simulation are also reviewed. The electron energy distribution functions are discussed by considering different inelastic interaction channels between electrons and heavy particles in a molecular CH 4 /H 2 plasma. r

Synthesis and Deposition of Ag Nanoparticles by Combining Laser Ablation and Electrophoretic Deposition Techniques

“…The rapid cooling realizes nanoparticles in liquids. In previous works, we have obtained ceramic and metal nanoparticles in water and in open air [20][21][22][23][24]. Moreover, nanoparticles obtained by PLAL are charged and, once synthesized in solution, can be electrodeposited in a suitable substrate.…”

“…There are different methods for nanoparticle deposition, such as chemical vapor deposition (CVD), physical vapor deposition (PVD), pulsed laser deposition (PLD), and sputtering. While most of these require sophisticated and expensive equipment [23][24][25], electrophoretic deposition (ED) is a simple and low-cost technique for nanomaterial deposition. This method has already been used to deposit Ag nanoparticles prepared by chemical methods [26].…”

Diamond-based electrodes for organic photovoltaic devices

“…One possibility is to substitute ITO with carbon-based electrodes such as heavily boron-doped conductive diamond polycrystalline films [2]. Polycrystalline diamond films can be produced by a large variety of chemical deposition techniques, such as hot filament deposition [3], bias enhanced deposition [4], and Plasma-Enhanced Chemical Vapor Deposition (PECVD) with linear antenna delivery, where precursor gases are ionized to enhance their chemical reaction rates [5,6]. One of the advantages of the PECVD technique is the possibility to operate on a large variety of substrates at low deposition temperatures, which can be a crucial condition in the manufacture of semiconductors.…”

Nanoparticle film deposition using a simple and fast centrifuge sedimentation method

“…Methods to deposit nanoparticles (NPs) on a variety of platforms are a key part of the technology development. Current procedures of depositing nanoparticles on solid surfaces include chemical vapor deposition (CVD) (Okada 2007), physical vapor deposition (PVD) (Kong et al 2001), sputtering (Brodsky et al 1977), lithography (Chou et al 1997), spin coating (Chang et al 2004), pulsed-laser deposition (PLD) (Aziz 2008), and supercritical fluid CO 2 (sc-CO 2 ) deposition (Smetana et al 2008;Wang et al 2010). Most nanoparticle deposition techniques require specific equipment and a high level of technical expertise.…”