Plasma flux motion in a toroidal plasma guide

Aksenov, I.I.; Belokhvostikov, A N; Padalka, V. G.; Repalov, N. S.; Khoroshikh, V.M.

doi:10.1088/0741-3335/28/5/002

Cited by 124 publications

(87 citation statements)

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“…Focusing on film growth conditions dominated by very large ion fluxes, also known as 'energetic deposition' or 'energetic condensation' from the plasma phase [7,[14][15][16], such as filtered cathodic arc deposition [7,17,18], HIPIMS [19][20][21][22], or sustained self-sputtering [23][24][25][26], and other forms of ionized physical vapor deposition [27,28], researchers have called for a more comprehensive SZD that includes the effects of ions on film growth. In response, an extended SZD is presented here that generalizes the illustration by Thornton; it is also made clear that any such presentation can only serve for rough orientation and that each combination of substrate, film material, and deposition conditions represent a unique system that is not adequately described by a SZD.…”

Section: A Brief (And Necessarily Incomplete) Review Of Structure Zonmentioning

confidence: 99%

A structure zone diagram including plasma-based deposition and ion etching

2010

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An extended structure zone diagram is proposed that includes energetic deposition, characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high power impulse magnetron sputtering. The axes are comprised of a generalized homologous temperature, the normalized kinetic energy flux, and the net film thickness, which can be negative due to ion etching. It is stressed that the number of primary physical parameters affecting growth by far exceeds the number of available axes in such a diagram and therefore it can only provide an approximate and simplified illustration of the growth condition-structure relationships.

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Section: A Brief (And Necessarily Incomplete) Review Of Structure Zonmentioning

confidence: 99%

A structure zone diagram including plasma-based deposition and ion etching

2010

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“…The elimination of macroparticles is achieved by a non-line-of-sight design between the cathode and substrate. Due to their trajectory, the macroparticles are blocked out very effectively by the non-direct path [80]- [85]. At the same time, the emitted electrons and ions need to be guided efficiently to the substrate, which is achieved by a combination of an axial magnetic field and an electric field around the travel path of the plasma.…”

Section: Filtering Systemsmentioning

confidence: 99%

Cavitation erosion resistance of NiTi thin films produced by Filtered Arc Deposition

Yang

Tieu

Dunne

et al. 2009

Wear

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AcknowledgementsFirst and foremost, I would like to thank my principal supervisor, Professor A. Kiet.Tieu., for providing timely and insightful advice, financial and spiritual support. My supervisor's implicit trust in my research abilities not only allowed me to freely pursue my goals, but also gave me an opportunity to learn how to manage time and allocate resources. Special thanks go to Professor Druce Dunne, for his insightful instruction and for all the generous attention and time he devoted to my research work. Tables Table 5. List of List of Figures AbstractThe objective of this work was to produce near-equiatomic NiTi thin films by filtered arc deposition system (FADS) to improve the cavitation erosion resistance of a steel base working in liquid. First, deposition conditions were optimized in order to obtain near-equiatomic NiTi films. Energy dispersive spectroscopy (EDS) was used to measure the composition of films. It was found that both the substrate bias voltage and arc current affect the compositions of as-deposited NiTi films. X-ray diffractometry (XRD) and transmission electron microscopy (TEM) were used to investigate the microstructures of Ni-rich, Ti-rich and near-equiatomic films. Their thermal behaviours were tested using differential scanning calorimetry (DSC). Atomic force microscopy (AFM), ultra micro-indentation system (UMIS) and Romulus scratch testing were used to measure the roughness, hardness and adhesive force of a near-equiatomic thin film.The cavitation erosion resistance of the near-equiatomic NiTi film was assessed using ASTM Test Method G32. It was found that NiTi thin films showed significantly higher cavitation erosion resistance than 316 austenitic stainless steel. The improved cavitation erosion resistance was attributed to the recoverable deformation associated with pseudoelasticity of the NiTi thin film.The effect of substrate temperature on the properties of NiTi thin films was investigated by preheating substrates to different temperatures (130 C, 300 C, 430 C and 600 C). temperature of 600 C was more resistant to cavitation erosion than films deposited at other bias voltages with a similar substrate temperature.The effect of substrate material on the properties of NiTi thin films was investigated by comparing films on mild steel and on austenitic stainless steel. For similar deposition conditions, the NiTi film deposited on mild steel consisted of B2, B19' and R phases, while the NiTi film on stainless steel was dominated by B2 parent phase. This is probably because the lower thermal conductivity of austenitic stainless steel resulted in a higher deposition temperature.The dominance of the B2 phase for deposition with a high substrate temperature, a high bias voltage and the use of stainless steel substrate was not found to be due to Ni-enrichment of the films, but is consistent with stabilization of the parent phase by possible pick-up oxygen and nitrogen from the chamber atmosphere when the deposition temperature is high.The research program successfully pro...

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“…It is also necessary that the high voltage sheath width be not too small [11], otherwise breakdown across the sheath can occur as for the case of a substrate with sharp edges. (5) where n. is 0.6 of the bulk density for a non-drifting plasma to account for the pre-sheath.…”

Section: Discussionmentioning

confidence: 99%

Some consequences to ion source behavior of high plasma drift velocity

Brown

Monteiro

Bilek

et al. 2000

Review of Scientific Instruments

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We consider the case of energetic ion beam formation when the ion streaming velocity within the source plasma is substantial, i.e., when the ions have a drift speed (in the positive downstream direction) that is on the order of or greater than the ion acoustic speed in the plasma. Some interesting consequences can follow, including the capability of a negatively biased substrate located in the plasma stream to maintain high bias voltage, and of an ion source with no extractor or “conventionally poor” extractor providing a kind of plasma immersion ion implantation mode of operation. Here we summarize the kind of plasma geometry in which this situation can occur, and describe some experimental observations we’ve made of these effects, with reference to a simple theoretical basis for the mechanism.

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Plasma flux motion in a toroidal plasma guide

Cited by 124 publications

References 1 publication

A structure zone diagram including plasma-based deposition and ion etching

A structure zone diagram including plasma-based deposition and ion etching

Cavitation erosion resistance of NiTi thin films produced by Filtered Arc Deposition

Some consequences to ion source behavior of high plasma drift velocity

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