Plasma-immersion formation of high-intensity gaseous ion beams

Ryabchikov, A. I.; Sivin, D. O.; Корнева, О. С.; Ananyin, P.S.; Ivanova, Anna I.; Stepanov, I.B.

doi:10.1016/j.vacuum.2019.04.024

Cited by 12 publications

(2 citation statements)

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“…Plasma generation was carried out using a gas-discharge plasma formed by non-self-sustained arc discharge with a thermionic and hollow cathodes "PINK" [12]. High-intensity nitrogen ion beam formation was carried out by a method of plasma-immersion ion extraction from free plasma boundary, their acceleration in a high-voltage sheath, followed by ballistic focusing, similar to the approach described in previous works [9,13]. To generate lowenergy ion beams, a focusing system was used in the form of a part of a sphere with a curvature radius of 75 mm, made of a metal mesh with a cell size of 1.8×1.8 mm 2 .…”

Section: Methodsmentioning

confidence: 99%

“…One of the efficient methods of surface modification is ion implantation, which makes it possible to significantly change the structure and phase composition of materials. In recent years, the method of high-intensity low-energy ion implantation has been actively developed [9]. The method is based on plasma-immersion extraction of ions from the free plasma boundary, their acceleration in a high-voltage sheath, followed by ballistic focusing, and allows forming high-density ion beams, which makes it possible to multiply the ion implantation fluence.…”

Section: Introductionmentioning

confidence: 99%

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Repetitively-pulsed nitrogen implantation in titanium by a high-power density ion beam

Ryabchikov¹,

Корнева²,

Sivin³

et al. 2022

8th International Congress on Energy Fluxes and Radiation Effects

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The article presents the results of studies of the features and regularities of high-intensity nitrogen ion implantation into titanium using repetitively-pulsed beams with high average and pulsed power densities. It is shown that the method of low-energy high-intensity nitrogen ion implantation at current densities of 180, 140, 60, and 10 mA/cm2 makes it possible to obtain wide ion-doped layers in titanium. The regularities of changes in both thickness and elemental composition of ion-doped layers depending on the ion current density have been established. It has been established that a wide diffusion layer is observed at ion current densities from 60 to 180 mA/cm2. Nitrogen concentration in the diffusion layer increases with an increase in the ion current density. As a result of a long high-intensity implantation process at temperatures of 700 and 850 °C, the titanium microstructure deteriorates in the entire volume of the sample material. The article presents the transmission electron microscopy data showing that the modified layers at a depth of 10 μm consist of a-Ti, in the volume of which nanosized particles of d-TiN with average size of 15.4 nm crystallize. Numerical simulation is used to study the change in temperature fields in titanium under the action of a pulsed and repetitively-pulsed ion beam with submillisecond duration on the surface with a power density from 20 to 30 kW/cm2. The results of experimental studies of the pulsed impact of high-pulse ion beams on the titanium microstructure are discussed.

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Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%