Plasma nitriding and ion plating with an intensified glow discharge

Korhonen, Ari; Sirvio, E.H.; Sulonen, M.S.

doi:10.1016/0040-6090(83)90301-2

Cited by 50 publications

(9 citation statements)

References 13 publications

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“…However, in relation to the system presented here, the existing nitrided layer was already a kind of interlayer between the steel substrate and the PVD coating, as there is general agreement on the good suitability of nitriding pre-treatments for subsequent hard coating. 8,[11][12][13] What is of greater importance is whether a CL is formed during the nitriding process, because this can be viewed as a further interlayer and must be considered in a differentiated manner. In such cases where a CL does not dissociate during the PVD process and instead remains intact, it can be assumed to be beneficial for the stability of the duplex layer system because of the smoother hardness and stiffness gradients that result.…”

Section: Discussionmentioning

confidence: 99%

Sliding wear behavior of duplex coatings with different plasma nitride layers and a Cr‐Al‐Ti‐B‐N coating

Weinhold

Dalke

Schramm

et al. 2021

Engineering Reports

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The dry sliding wear behavior of AISI D2 tool steel is investigated under different heat treatment states in hardened, plasma nitrided, and duplex layer conditions. Plasma nitriding (PN) is performed at 510-520 • C with varying N 2 -H 2 gas mixtures, and Cr-Al-Ti-B-N layers are deposited at 480 • C by means of physical vapor deposition (PVD). This work investigates the influence of the nitride layer and, in particular, the presence of a compound layer on the tribological behavior of the duplex layer system. Therefore, as-nitrided conditions both without and with a compound layer -as well as with a mechanically removed compound layer -are subsequently hard coated. Comparative ball-on-disc wear tests in linear-reciprocating sliding motion against WC-Co counterbody balls are conducted at a load of 120 N. Compared to sample states without a compound layer, the as-nitrided states with a compound layer exhibit improved wear coefficients. In contrast, all duplex layer states exhibit comparably low friction coefficients and low wear coefficients independently of the presence of a compound layer.Removal of the compound layer prior to PVD coating leads to a significant reduction in wear resistance due to reduced surface roughness before the hard coating and the associated change in the bonding between the nitride layer and hard coating. K E Y W O R D Scompound layer, duplex surface engineering, friction and wear, plasma nitriding, PVD hard coating INTRODUCTIONTool steels are the preferred materials for most fields of application with demanding tribological working conditions -such as die casting, forging, stamping, cutting, and rolling. [1][2][3] One widely used representative of this group of steels is X155CrVMo12-1 (AISI D2), which is applied in complex applications involving, for example, high normal loads and sliding speeds. 4,5 In order to counteract the associated reduction in tool life, hard coatings produced by surface treatment techniques such as plasma nitriding (PN) and physical vapor deposition (PVD) hard coating are commonly applied. PN affords significant improvements in surface hardness, fatigue strength, corrosion, and wear resistance 3,4,6 compared to conventional steels. However, nitrided layers do not provide sufficient resistance in highly aggressive environments or under heavy mechanical stresses. [2][3][4]6,7 PVD hard coatings are mainly used because of their high hardness and excellentThis is an open access article under the terms of the Creative Commons Attribution-NonCommercial-NoDerivs License, which permits use and distribution in any medium, provided the original work is properly cited, the use is non-commercial and no modifications or adaptations are made.

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Section: Discussionmentioning

confidence: 99%

Sliding wear behavior of duplex coatings with different plasma nitride layers and a Cr‐Al‐Ti‐B‐N coating

Weinhold

Dalke

Schramm

et al. 2021

Engineering Reports

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“…Between the low-voltage ( several kV)/high-pressure (ten to thousands of Pa) conditions used in conventional plasma nitriding [7,8] and the high-voltage (up to 100 kV)/lowpressure (∼10 −2 Pa) conditions used in PIII [1-5, 9, 10], there exists a medium-voltage (tens of kV)/medium-pressure (0.1 to several Pa) process window to conduct pulsed high-voltage glow discharge treatment. In this process, the plasma is sustained by the glow discharge when a voltage is applied to the objects.…”

Section: Introductionmentioning

confidence: 99%

Experimental investigation of the electrical characteristics and initiation dynamics of pulsed high-voltage glow discharge

Xia¹,

Chu²

2001

J. Phys. D: Appl. Phys.

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Pulsed high-voltage glow discharge, a process that falls between conventional plasma ion implantation and plasma nitriding, is a potentially effective surface treatment technique. The electrical characteristics and initiation dynamics of the process are experimentally investigated in this work. The discharge behaviour is found to depend on the applied voltage, gas pressure, pulse duration, and pulsing frequency. The voltage-current characteristics basically obey the collisionless Child-Langmuir relationship, and the discharge current varies substantially with the applied voltage and gas pressure in the high-voltage, high-pressure domain. The seed plasma before each glow discharge pulse affects the initiation mechanism regardless of whether it is sustained by an external plasma source or it is simply the residual plasma of the afterglow after the voltage pulse has been turned off. Our results also disclose that the presence of an initial plasma before the glow discharge is ignited has a large impact on the initiation time of the glow discharge but has only a slight effect on the steady-state current.

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“…For many applications, however, the temperatures which are r e q~r e d for thermal nitridation are too high. Therefore, attempts were made to use nitrogen plasmas which were successful in the cases of magnesium [2], titanium [3], and silicon [4,5], but to our knowledge not in the case of aluminium so far [6]. Low-temperature conversion of aluminium films into aluminium nitride has been demonstrated by high-energy ion implantation only [7,8].…”

Section: Introductionmentioning

confidence: 99%

Kinetics and Mechanism of Plasma Nitridation of Thin Aluminium Films

Jung¹

1986

phys. stat. sol. (a)

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Thin aluminium oxynitride films are formed by plasma nitridation of aluminium. The process is studied for anodic and cathodic treatment in rf and dc generated plasmas of pure nitrogen. The most effective process regarding large thickness and low oxygen content of the films is the cathodic dc nitridation. At typical conditions (325 °C, 130 Pa gas pressure, and 30 min duration) the film thickness reaches 12.5 nm and the oxygen content is 7%. The films are homogeneous and metal‐free but show a graduated transition to the underlying unreacted aluminium metal. The nitrogen transport mechanism is diffusion controlled but influenced by electron bombardment (anodic nitridation) and ion implantation (cathodic nitridation), respectively.

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Plasma nitriding and ion plating with an intensified glow discharge

Cited by 50 publications

References 13 publications

Sliding wear behavior of duplex coatings with different plasma nitride layers and a Cr‐Al‐Ti‐B‐N coating

Sliding wear behavior of duplex coatings with different plasma nitride layers and a Cr‐Al‐Ti‐B‐N coating

Experimental investigation of the electrical characteristics and initiation dynamics of pulsed high-voltage glow discharge

Kinetics and Mechanism of Plasma Nitridation of Thin Aluminium Films

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