Plasma parameters and volume kinetics in Cl2/O2 mixtures

Efremov, A. M.; Kwon, Kwang‐Ho; Park, C.-S.; Choi, Sang-Chul; Kim, C. I.; Chai, Sen

doi:10.1007/s10854-005-1141-y

Cited by 2 publications

(3 citation statements)

References 6 publications

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“…The differences between experimental measurements and model predictions that we show for this limited set of conditions are typical of other conditions. Several studies of Cl 2 plasmas or Cl 2 with Ar or O 2 additions have been reported in the literature [6,[31][32][33][34][35][36][37]. However, either the operating conditions or system investigated is significantly different from those in our current study, which makes direct comparison difficult.…”

Section: Ar/o 2 /Cl 2 Chemistrymentioning

confidence: 72%

Comparison of model and experiment for Ar, Ar/O₂and Ar/O₂/Cl₂inductively coupled plasmas

Hsu

Nierode

Coburn

et al. 2006

J. Phys. D: Appl. Phys.

107

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Comparisons of fluid model predictions with various measurements in an inductively coupled plasma are reported. The gas chemistries used include pure Ar, mixtures of Ar and O2 and mixtures of Ar, O2 and Cl2 for pressures ranging from 10 to 80 mTorr and plasma densities ranging from ∼1010–1011 cm−3. Measurements of electron density, electron energy probability function, positive ion composition and wall flux and neutral radical concentration at the chamber wall are reported and compared with corresponding model predictions. The model treats electrons, ions and neutrals as fluids, under the assumption of quasineutrality. Power into electrons is from inductive coupling from an external coil and capacitive coupling is neglected. The non-isothermal, multicomponent reacting flow equations with jump boundary conditions are used to describe neutrals and are solved iteratively with the plasma and electromagnetic equations until a steady solution is found. Radical and ion composition predictions are shown to be in reasonable agreement for Ar and Ar/O2 plasmas, but the corresponding predictions in mixtures of Ar, O2 and Cl2 are in only partial agreement with measurements, implying that the chemical reaction database for this chemistry requires further work.

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Section: Ar/o 2 /Cl 2 Chemistrymentioning

confidence: 72%

Comparison of model and experiment for Ar, Ar/O₂and Ar/O₂/Cl₂inductively coupled plasmas

Hsu

Nierode

Coburn

et al. 2006

J. Phys. D: Appl. Phys.

107

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“…We are aware of only a handful of experimental characterizations of Cl 2 /O 2 plasmas that demonstrate the behavior of the various plasma parameters with oxygen dilution [14,15,[17][18][19]. Guha and Donnelly [14] measured the electron temperature, the electron, positive ion and atomic chlorine densities as a function of oxygen dilution for their study of the wall recombination coefficient γ rec in a Cl 2 /O 2 discharge.…”

Section: Comparison With Measurementsmentioning

confidence: 99%

“…Guha and Donnelly [14] studied the Cl 2 /O 2 discharge thoroughly, including measuring T e , n e , n + and n Cl versus oxygen content and recombination of Cl atoms and formation of the ClO molecule on the chamber walls. Efremov et al [15][16][17] investigated the influence of the Cl 2 /O 2 mixing ratio on the various plasma parameters both theoretically and experimentally in an inductively coupled discharge. Skorodumov et al [18] measured the atomic chlorine density by optical emission spectroscopy in a Cl 2 /O 2 dc discharge and Hsu et al [19] compared results of a fluid model with measurements in mixtures of O 2 , Cl 2 and Ar in an inductively coupled discharge.…”

Section: Introductionmentioning

confidence: 99%

The low pressure Cl₂/O₂discharge and the role of ClO

Thorsteinsson¹,

Guðmundsson²

2010

Plasma Sources Sci. Technol.

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A global (volume averaged) model is applied to a low pressure (1-100 mTorr) high density chlorine discharge that is diluted with oxygen. The influence of oxygen dilution on the particle densities and the electron temperature is explored. The electronegativity is found to increase strongly with increased pressure in a chlorine-rich mixture, whereas it is nearly pressure independent in an oxygen-rich mixture. The chlorine dissociation fraction increases with increased oxygen dilution, although the increase is neither pronounced nor sharp at low oxygen content. We explore the role of the ClO molecule in the discharge and confirm that the ClO molecule is mainly created through recombination of Cl and O atoms at the chamber wall, which in turn significantly increases the loss of Cl atoms in oxygen-rich mixtures. The most important loss process for ClO is electron impact dissociation in the plasma bulk. The molecular ion ClO + is almost entirely created by charge transfer for oxygen dilution below 67%, while electron impact ionization becomes the dominant creation process for ClO + at higher dilution.

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Plasma parameters and volume kinetics in Cl2/O2 mixtures

Cited by 2 publications

References 6 publications

Comparison of model and experiment for Ar, Ar/O₂and Ar/O₂/Cl₂inductively coupled plasmas

Comparison of model and experiment for Ar, Ar/O₂and Ar/O₂/Cl₂inductively coupled plasmas

The low pressure Cl₂/O₂discharge and the role of ClO

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Plasma parameters and volume kinetics in Cl2/O2 mixtures

Cited by 2 publications

References 6 publications

Comparison of model and experiment for Ar, Ar/O2and Ar/O2/Cl2inductively coupled plasmas

Comparison of model and experiment for Ar, Ar/O2and Ar/O2/Cl2inductively coupled plasmas

The low pressure Cl2/O2discharge and the role of ClO

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Comparison of model and experiment for Ar, Ar/O₂and Ar/O₂/Cl₂inductively coupled plasmas

Comparison of model and experiment for Ar, Ar/O₂and Ar/O₂/Cl₂inductively coupled plasmas

The low pressure Cl₂/O₂discharge and the role of ClO