“…For all data sets examined, the same slope of the Arrhenius regime can now be observed (Figure b), i.e., the plasma polymer film depositions indeed follow the same plasma chemical reaction pathway. As it was discussed in previous papers, the mass deposition rate R m within the Arrhenius regime can be described by where A dep is the deposition area (electrode size), ϵ a is the (apparent) activation energy, and G′ is the reactor‐dependent factor comprising the sticking probability, the molecular mass of the film‐forming species, and the energy transfer efficiency (which depends on the plasma source and the size of the reactor, i.e., on the electron energy distribution function) …”