Plasma Resistances of Yttria Deposited by EB-PVD Method

Kim, Daemin; Yoon, Sang Hyun; Kim, Kyeong-Beom; Kim, Hui-Sik; Oh, Young−Jei; Lee, Sung-Min

doi:10.4191/kcers.2008.45.1.707

Cited by 17 publications

(4 citation statements)

References 5 publications

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“…Given that defect reduction attracts much attention as a result of development in semiconductor technology, this study tested the stability against plasma in Al 2 O 3 and Y 2 O 3 with a view to reduce A1 particles known as a major cause of chamber particles in dry etcher process and to replace one of Al sources, Al 2 ceramic materials formed in optimization process underwent a test for durability against 'F' series plasma. To sum up, Y 2 O 3 was found to be approximately 10 times as stable as Al 2 O 3 .…”

Section: Resultsmentioning

confidence: 99%

See 1 more Smart Citation

Improved particle control by adopting advanced ceramic materials in dry etcher for defect reduction

Min¹,

Hwang²,

Lee³

et al. 2009

SPIE Proceedings

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Section: Resultsmentioning

confidence: 99%

“…As the environment for semiconductor process calls for high density plasma and high productivity, a material with greater plasma resistance that that of Alumina (Al 2 O 3 ) material is needed. Yttria (Y 2 O 3 ) is considered a new material to meet the demand [2].…”

Section: Introductionmentioning

confidence: 99%

Improved particle control by adopting advanced ceramic materials in dry etcher for defect reduction

Min¹,

Hwang²,

Lee³

et al. 2009

SPIE Proceedings

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“…17,18) However, in SPS, because of differences in the masses of the molten droplets, the shorter solidification time of the molten droplet compared to that of the molten droplet in the conventional plasma spray may be the cause of the monoclinic phase development. In previous the investigation of the electron beam PVD of Y 2 O 3 , 19,20) monoclinic phase formation of the Y 2 O 3 coating was believed to be due to the effect of the quenching of the deposited Y 2 O 3 atoms.…”

Section: Crystalline Structures and O/y Ratio Of Y 2 Omentioning

confidence: 99%

Effect of Processing Parameters and Powder Size on Microstructures and Mechanical Properties of Y<sub>2</sub>O<sub>3</sub> Coatings Fabricated by Suspension Plasma Spray

Kim¹,

Lee²,

Oh³

et al. 2015

Journal of the Korean Ceramic Society

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The suspension plasma spray (SPS) technique has been used to obtain dense Y 2 O 3 coatings and to overcome the drawbacks of the conventional air plasma spray (APS). SPS uses suspensions containing micrometer or sub-micrometer sized powders dispersed in liquid media. In this study, microstructure developments and mechanical properties have been investigated as functions of particle size of source material and plasma processing parameters such as plasma power and stand-off distance. The microstructure of the coating was found to be highly related to the particle size and the plasma processing parameters, and it was directly reflected in the hardness and the adhesion strength. When fine powder (BET 16.4 m 2 /g) was used as a raw material in the suspension, there was, with increasing stand-off distance, a change from a dense structure with a slightly bumpy surface to a porous structure with a cauliflower-like surface. On the other hand, when a coarse powder (BET 2.8 m 2 /g) was used, the coating density was lower, with microscopic splats on the surface. Using fine Y 2 O 3 powders, the coating layer with an optimum short stand-off distance showed a high hardness of approximately 90% of that of sintered Y 2 O 3 and an adhesion strength several times higher than that of the coating by conventional APS.

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“…Conventionally, plasma spraying was mainly used for yttria coating, and chemical vapor deposition (CVD) and physical vapor deposition (PVD) coating methods were reported to be used [3,4]. However, the plasma spraying, easily forms cracks due to the thermal expansion coefficient difference with the substrate and is limited in forming high-density coating layers.…”

Section: Introductionmentioning

confidence: 99%

Archives of Metallurgy and Materials

Wi¹,

Ham²,

Kim³

et al. 2018

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This study attempted to manufacture an Y 2 O 3 ceramic coating layer on a ceramic (AlN) substrate using aerosol deposition (AD) and investigated its macroscopic properties. Pure Y 2 O 3 powder with a polygonal shape and average size of 5.0 μm was used as initial feedstock. Using aerosol deposition with suitable process conditions, an Y 2 O 3 coating layer was successfully fabricated on aluminum nitride (AIN). The thickness of the manufactured coating layer was approximately 10 mm. The coating layer consisted of Y 2 O 3 phase identical to that in the initial powder, and no additional oxides were identified. In regard to the roughness of the Y 2 O 3 coating layer, the average roughness (R a ) measured 1.32 μm, indicating that the surface roughness was relatively even compared to the initial powder size (5 μm). Mechanical properties of the Y 2 O 3 coating layer were measured using nano indentation equipment, and the indentation modulus of the Y 2 O 3 coating layer fabricated by aerosol deposition measured 136.5 GPa. The interface of the coating layer was observed using TEM, and the deposition mechanism of the Y 2 O 3 coating layer manufactured by aerosol deposition was also discussed.

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Plasma Resistances of Yttria Deposited by EB-PVD Method

Cited by 17 publications

References 5 publications

Improved particle control by adopting advanced ceramic materials in dry etcher for defect reduction

Improved particle control by adopting advanced ceramic materials in dry etcher for defect reduction

Effect of Processing Parameters and Powder Size on Microstructures and Mechanical Properties of Y<sub>2</sub>O<sub>3</sub> Coatings Fabricated by Suspension Plasma Spray

Archives of Metallurgy and Materials

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