Plasma sheath model and ion energy distribution for all radio frequencies

Panagopoulos, Theodoros; Economou, Demetre J.

doi:10.1063/1.369701

Cited by 139 publications

(87 citation statements)

References 22 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…6,7 After 1990, dual-frequency discharges have drawn much attention due to their independent control of the ion fluxes and ion bombarding energies at the substrates. Analytical 8 and semi-analytical 9 models were developed to better understand the mechanics in multi-frequency capacitive discharges.…”

mentioning

confidence: 99%

Verification of collisionless sheath model of capacitive rf discharges by particle-in-cell simulations

Wang

Lieberman

et al. 2011

Journal of Applied Physics

View full text Add to dashboard Cite

A global model for high voltage rf argon capacitive discharges in the collisionless sheath regime is verified by particle-in-cell simulations, for both current- and voltage-driven sources. The ion energy distributions (IEDs) and the IED widths are investigated and show good agreement with a theoretical model, with proper adjustment of the dc bias voltage. The sensitivities of IEDs to sources (current or voltage driven) are described. It is found that for the same variations of rf source amplitudes, larger voltage shifts are expected in the IEDs for the current-driven than the voltage-driven cases. The effects of rf frequencies on IEDs are determined for a fixed rf voltage-driven source amplitude. The IEDs show a surprising independence of the rf frequencies, which can be understood reasonably well by the combined scalings of the global discharge model and IED theoretical model.

show abstract

mentioning

confidence: 99%

Verification of collisionless sheath model of capacitive rf discharges by particle-in-cell simulations

Wang

Lieberman

et al. 2011

Journal of Applied Physics

View full text Add to dashboard Cite

show abstract

“…A lower ion flux arrives toward the surface and thus reducing ion-assisted mechanisms. The second one is the decrease in ion mean energy [24]. Ions are accelerated toward the sample surface through a sheath.…”

Section: Etch Ratesmentioning

confidence: 99%

Inductively coupled plasma etching of ultra-shallow Si3N4 nanostructures using SF6/C4F8 chemistry

Sang

Gour

Jaouad

et al. 2015

Microelectronic Engineering

View full text Add to dashboard Cite

“…8), edge (point P), and 125 m (midpoint between point O and P). The shape of the IEDs depends on a ratio of the ion transit time in the sheath to the RF period of the sheath potential [11]. When , ions cross the sheath in a small fraction of the RF period, and experience the instantaneous potential drop of the sheath, thus having a double peaked energy distribution.…”

Section: Ion Energy and Angular Distributions Along The Trench Bottommentioning

confidence: 99%

Plasma molding over surface topography: simulation and measurement of ion fluxes, energies and angular distributions over trenches in RF high density plasmas

Kim

Economou

Woodworth

et al. 2003

IEEE Trans. Plasma Sci.

View full text Add to dashboard Cite

A two-dimensional (2-D) fluid/Monte Carlo (MC) simulation model was developed to study plasma "molding" over a trench. The radio frequency sheath potential evolution and ion density and flux profiles over the surface were predicted with a selfconsistent fluid simulation. The trajectories of ions and energetic neutrals (resulting by ion neutralization on surfaces or charge exchange collisions in the gas phase) were then followed with a MC simulation. For sheath thickness comparable to the trench width , ions were strongly deflected toward the trench sidewall, and the ion flux along the trench surface contour was highly nonuniform. Irrespective of the trench depth, the normalized spatially-average ion flux at the trench mouth showed a minimum at 1.0. The normalized spatially-average ion flux at the trench bottom decreased with increasing trench depth (or aspect ratio). As the trench sidewall was approached, the energy spread 1 of the ion energy distributions (IEDs) at the trench bottom decreased for a thin sheath, but increased for a thick sheath. At the trench bottom, the neutral flux was comparable to the ion flux over the entire range of sheath thickness studied. Simulation results were in good agreement with experimental data on ion flux, IEDs, and ion angular distributions at the trench bottom.Index Terms-Ion angular distribution, ion energy distribution (IED), ion flow in trenches, Monte Carlo (MC) simulation, plasma molding, two-dimensional (2-D) plasma sheath.

show abstract

Plasma sheath model and ion energy distribution for all radio frequencies

Cited by 139 publications

References 22 publications

Verification of collisionless sheath model of capacitive rf discharges by particle-in-cell simulations

Verification of collisionless sheath model of capacitive rf discharges by particle-in-cell simulations

Inductively coupled plasma etching of ultra-shallow Si3N4 nanostructures using SF6/C4F8 chemistry

Plasma molding over surface topography: simulation and measurement of ion fluxes, energies and angular distributions over trenches in RF high density plasmas

Contact Info

Product

Resources

About