2022
DOI: 10.1016/j.apsusc.2021.151963
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Plasma surface treatment of polystyrene in a low power low frequency argon glow discharge

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Cited by 12 publications
(7 citation statements)
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“…Plasma treatment is a process that modifies any surface in a controlled, reproducible, and homogeneous manner. Mostly, it is used for surface cleaning, etching, functional group modification, or cross-linking of organic molecules/polymer chains. The plasma creates a number of reactive species, notably photons, electrons, ions, radicals, and so forth, and this process initiates secondary reactions as well . Here, Ar–O 2 plasma treatment is used for surface modification of CsPbBr 3 NCs films, as shown schematically in Figure a.…”
Section: Resultsmentioning
confidence: 99%
“…Plasma treatment is a process that modifies any surface in a controlled, reproducible, and homogeneous manner. Mostly, it is used for surface cleaning, etching, functional group modification, or cross-linking of organic molecules/polymer chains. The plasma creates a number of reactive species, notably photons, electrons, ions, radicals, and so forth, and this process initiates secondary reactions as well . Here, Ar–O 2 plasma treatment is used for surface modification of CsPbBr 3 NCs films, as shown schematically in Figure a.…”
Section: Resultsmentioning
confidence: 99%
“…[9] According to the literature, Ar plasma etching is relatively uniform. [73][74][75] Changing the type of combined gas with argon can also change the surface's hydrophobic/hydrophilic properties. For example, adding N 2 to a hydrophobic surface modified by Ar/HMDS plasma can cause it to become super hydrophobic, whereas adding O 2 causes it to become super-hydrophilic, [38] as demonstrated in Figure 10B.…”
Section: Gas Typementioning
confidence: 99%
“…Figure 1 shows the schematic of the setup for plasma treatment of PTFE, which has been described in detail in our previous article [27]. The plasma chamber was made of stainless steel with internal volume of 38.6 l. Two disc-shaped brass electrodes, each of radius 4.5 cm, were placed parallel to each other with a gap separation of 3 cm inside the chamber as shown in figure 1.…”
Section: Hz Glow Discharge Systemmentioning
confidence: 99%