2002
DOI: 10.1351/pac200274030471
|View full text |Cite
|
Sign up to set email alerts
|

Plasma synthesis of catalytic thin films

Abstract: Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
6
0

Year Published

2007
2007
2016
2016

Publication Types

Select...
6
1

Relationship

2
5

Authors

Journals

citations
Cited by 9 publications
(6 citation statements)
references
References 7 publications
0
6
0
Order By: Relevance
“…For this reason, plasma processing, including the APD method, or electrical explosion have attracted a lot of attention because it is possible to not only prepare the nanoparticles or thin films without using an organic capping agent to but also synthesize nanocatalysts at a large scale. [29][30][31][32][33] This is mainly due to the high reactivity of the medium via which the energetic transfer occurs through various forms: excited atoms or molecules, radicals, ions, electrons, etc.…”
Section: Experimental Details 1 Preparation Of N-or P-doped Gan Subst...mentioning
confidence: 99%
“…For this reason, plasma processing, including the APD method, or electrical explosion have attracted a lot of attention because it is possible to not only prepare the nanoparticles or thin films without using an organic capping agent to but also synthesize nanocatalysts at a large scale. [29][30][31][32][33] This is mainly due to the high reactivity of the medium via which the energetic transfer occurs through various forms: excited atoms or molecules, radicals, ions, electrons, etc.…”
Section: Experimental Details 1 Preparation Of N-or P-doped Gan Subst...mentioning
confidence: 99%
“…Most of the studies are related to ultra-fine particles production, direct catalyst deposition on a support [13,14] and also assistance of catalytic reactions [15,16]. Although very few studies are devoted to low pressure plasma deposition of catalytic thin films, the latter is expected to be advantageous for controlling low catalyst content and location [17][18][19][20][21][22][23].…”
Section: Introductionmentioning
confidence: 99%
“…Low temperature plasma has been extensively utilized in catalysis, including plasma-assisted synthesis of catalytic active ultra-fine particles and their deposition on support, plasma regeneration or plasma treatment of catalysts [31][32][33][34][35][36][37]. Most of the conventional methods for preparation of catalysts include high-temperature calcinations/reduction or pyrolysis in an inert atmosphere.…”
Section: Introductionmentioning
confidence: 99%