Plasmaborieren in einer BCl<sub>3</sub>-H<sub>2</sub>-Ar-Atmosphäre

Cabeo, E. Rodrı́guez; Laudien, G.; Biemer, S.; Rie, K.‐T.; Hoppe, Steffen; Frick, Manfred

doi:10.1515/htm-1999-540214

Cited by 5 publications

(3 citation statements)

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“…plasma generated in low-pressure electrical discharges, is used as a boron-containing medium. The plasma-assisted methods allow not only diffusive saturation of surface with boron, but also creation of boron coating on it [6], as it is implemented, for example, with the use of magnetron discharge [7].…”

Section: Introductionmentioning

confidence: 99%

In situ probe measurements of plasma parameters during the deposition of boron coatings by the magnetron method

et al. 2023

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The features of the probe technique are described and the results of measuring the parameters of plasma generated by a planar magnetron sputtering system with a pure boron target during coating deposition are presented. A feature of probe measurements was the use of heating the collecting surface of a single Langmuir probe. Heating led to a decrease in the electrical resistance of the boron film on the surface, which made it possible to carry out in situ probe measurements of the magnetron discharge plasma parameters during the entire process of boron coating. Keywords: plasma parameters, probe method, planar magnetron, boron films.

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Section: Introductionmentioning

confidence: 99%

In situ probe measurements of plasma parameters during the deposition of boron coatings by the magnetron method

et al. 2023

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“…BCl 3 is used as a source gas in various industrial plasma applications. Such plasmas are used for the surface modification of steel components in mechanical engineering and automotive industries 1) as well as for plasma etching of semiconductor devices. 2) The goal of boriding of steel substrates via plasma assisted chemical vapor deposition (PACVD) is the optimization of surface properties for various loading conditions.…”

Section: Introductionmentioning

confidence: 99%

Time-Resolved Quantum Cascade Laser Absorption Spectroscopy of Pulsed Plasma Assisted Chemical Vapor Deposition Processes Containing BCl₃

Lang

Hempel

Strämke³

et al. 2011

Jpn. J. Appl. Phys.

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The temperature, frequency, and voltage dependences of the dielectric properties of 0.93Pb(Fe 1=2 Nb 1=2 )O 3 -0.07PbTiO 3 single crystals were investigated in the temperature range of 100-300 K. An anisotropic colossal dielectric response was observed when the probe of the AC field was along the [100] and [111] directions. One relaxation was detected in the [100] direction, while two relaxations were detected in the [111] direction. The activation energies of the relaxations are in the range of 0.155-0.190 eV, indicating that the relaxations are probably caused by 3d electrons hopping between Fe 2þ and Fe 3þ . The origin of the anisotropic colossal dielectric response can be explained by a ''two-hopping path'' model.

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“…Boron trichloride (BCl 3 ) is a source gas of considerable interest in plasma research and industry. Plasmas containing BCl 3 are used for the surface modification of steel components in mechanical engineering and automotive industries [1] as well as for plasma etching of semiconductor devices [2]. The goal of plasma-assisted boriding of steel substrates is the optimization of surface properties for various loading conditions.…”

Section: Introductionmentioning

confidence: 99%

Plasma process monitoring of BCl₃using high-resolution infrared laser absorption spectroscopy

Hempel

Lang

Zimmermann

et al. 2010

Meas. Sci. Technol.

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Boron trichloride (BCl 3 ) is used as a source gas in various industrial plasma applications. The online monitoring of its ground state concentration in the plasma process reactor is vital for improved insight into the plasma chemistry and to increase productivity, reliability and reproducibility of the process. Infrared absorption spectroscopy was applied for in situ measurements of absolute densities of BCl 3 and HCl in planar microwave plasma sources as well as in an industrial pulsed dc discharge reactor. In this paper procedures for the determination of HITRAN format line strength data files for BCl 3 are described together with results of concentration measurements. The results show the influence of the discharge parameters on the dissociation of BCl 3 and its conversion to HCl. Observations using tuneable diode lasers are compared with measurements using quantum cascade lasers and the applicability of this diagnostic technique for industrial plasma process monitoring is shown.

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Plasmaborieren in einer BCl₃-H₂-Ar-Atmosphäre

Cited by 5 publications

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In situ probe measurements of plasma parameters during the deposition of boron coatings by the magnetron method

In situ probe measurements of plasma parameters during the deposition of boron coatings by the magnetron method

Time-Resolved Quantum Cascade Laser Absorption Spectroscopy of Pulsed Plasma Assisted Chemical Vapor Deposition Processes Containing BCl₃

Plasma process monitoring of BCl₃using high-resolution infrared laser absorption spectroscopy

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Plasmaborieren in einer BCl3-H2-Ar-Atmosphäre

Cited by 5 publications

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In situ probe measurements of plasma parameters during the deposition of boron coatings by the magnetron method

In situ probe measurements of plasma parameters during the deposition of boron coatings by the magnetron method

Time-Resolved Quantum Cascade Laser Absorption Spectroscopy of Pulsed Plasma Assisted Chemical Vapor Deposition Processes Containing BCl3

Plasma process monitoring of BCl3using high-resolution infrared laser absorption spectroscopy

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Plasmaborieren in einer BCl₃-H₂-Ar-Atmosphäre

Time-Resolved Quantum Cascade Laser Absorption Spectroscopy of Pulsed Plasma Assisted Chemical Vapor Deposition Processes Containing BCl₃

Plasma process monitoring of BCl₃using high-resolution infrared laser absorption spectroscopy