2007
DOI: 10.1002/ppap.200700019
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Plasmabromination – the Selective Way to Monotype Functionalized Polymer Surfaces

Abstract: In contrast to other plasma modification processes of polymer surfaces, the bromination is very selective and shows a high yield in CBr groups. The most convenient bromination process was found using bromoform, which was thus preferred to elemental bromine, allyl bromide, vinyl bromide or tert‐butylbromide. The bromoform process give yields in CBr up to 40 CBr or more, with only 2–3% co‐introduction of O‐functionalities whereas allyl bromide results in yields of about 20 CBr and more, but in more than 10% … Show more

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Cited by 51 publications
(35 citation statements)
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“…The allyl bromide plasma polymer (cf. [1]) showed an extraordinary high introduction of oxygen in the range of 10-18 oxygen per 100 C atoms. Not more than 75% of the Br introduced with the allyl bromide monomer (33 Br/100 C) could be found in the allyl bromide plasma polymer layer, also after applying the wash process with THF (27 Br/100 C).…”
Section: Coating Of Polyolefin Surfaces With Allyl Bromide Plasma Polmentioning
confidence: 98%
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“…The allyl bromide plasma polymer (cf. [1]) showed an extraordinary high introduction of oxygen in the range of 10-18 oxygen per 100 C atoms. Not more than 75% of the Br introduced with the allyl bromide monomer (33 Br/100 C) could be found in the allyl bromide plasma polymer layer, also after applying the wash process with THF (27 Br/100 C).…”
Section: Coating Of Polyolefin Surfaces With Allyl Bromide Plasma Polmentioning
confidence: 98%
“…Br atoms attach onto the macromolecules of the polymer substrate. Alternatively, Br-containing plasma polymer films (50-150 nm) using allyl bromide or vinyl bromide were deposited [1]. The maximal yield in Br introduction of the bromoform cw-plasma were 100 Br/100 C, after 180 s treatment, applied to polypropylene and 120 Br/100 C, after 180 s treatment, applied to polyethylene, cf.…”
Section: Bromination Of Polyolefin Surfaces By Bromoform Plasmamentioning
confidence: 99%
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