Plasmon-enhanced exciton emissions and Raman scattering of CVD-grown monolayer WS2 on Ag nanoprism arrays

Large-Scale Manipulation of Monolayer MoS2 Photoluminescence via Size-Tunable Plasmonic Nanoparticles: Implications for Information Encoding and Optical Anti-Counterfeiting

“…The dependence of the LSPR on the NP size shows red shifts from 592 to 707 nm as the particle diameter increased from about 48 to 120 nm. This also demonstrates the feasibility of the continuous and fine tuning of the plasmonic nanostructure in LSPR with a wide range of wavelengths via the developed film annealing technique, which is more advantageous than the related lithography methods. , Notably, the full-wave band from 600 to 700 nm of the 87 nm Au NP array exactly covers the emission spectrum of MoS 2 , suggesting that both the excitation and emission can be efficiently boosted, and this energy match is crucial for the optimized PL enhancement …”

“…This also demonstrates the feasibility of the continuous and fine tuning of the plasmonic nanostructure in LSPR with a wide range of wavelengths via the developed film annealing technique, which is more advantageous than the related lithography methods. 37,38 Notably, the full-wave band from 600 to 700 nm of the 87 nm Au NP array exactly covers the emission spectrum of MoS 2 , suggesting that both the excitation and emission can be efficiently boosted, and this energy match is crucial for the optimized PL enhancement. 51 In addition to the noble metal nanoparticles, a doped metal oxide-based plasmonic platform, fabricated by the large-scale spin-coating approach, can also offer a wide range of tunable LSPR through the modulation of dopant concentration or grain size at a lower cost.…”

“…Most of the state-of-the-art LSPR-tunable plasmonic hybrids are fabricated by high-cost and time-consuming electron-beam lithography, which fails to meet the demand for wafer-scale production. Whereas, inexpensive template-assisted methods, such as nanosphere lithography, possess a large-area production mode but often have a limited controllability on structure precision and plasmon resonance ranges, which hampers the continuous manipulation and prominent enhancement of the optical signals. , Notably, a delicately designed plasmon resonance fully covering the PL emission peak is also responsible for the tunable excitonic emissions such as A 1 and B 1 excitons (each having neutral and trion states) of monolayer MoS 2 . , …”

“…Whereas, inexpensive template-assisted methods, such as nanosphere lithography, possess a large-area production mode but often have a limited controllability on structure precision and plasmon resonance ranges, which hampers the continuous manipulation and prominent enhancement of the optical signals. 37,38 Notably, a delicately designed plasmon resonance fully covering the PL emission peak is also responsible for the tunable excitonic emissions such as A 1 and B 1 excitons (each having neutral and trion states) of monolayer MoS 2 . 39,40 In this work, we construct an LSPR-tunable plasmonic platform to effectively boost and manipulate the PL of MoS 2 .…”

Plasma and Gas‐based Semiconductor Technologies for 2D Materials with Computational Simulation & Electronic Applications

“…The enhancement of their optical properties through surface plasmon resonance is suitable for the application of atomically thin TMDs in optoelectronics and photonics, as shown in Figure 3h. In their study on TMDs, Yang et al [82] fabricated a monolayer of WS 2 grown by CVD and transferred it onto an Ag/WS 2 hybrid structure, achieving significantly improved photoluminescence emission and Raman scattering. According to calculations, the plasmonic enhancement mainly arises from the highly enhanced local electric fields and charge transfer.…”