2018
DOI: 10.1002/solr.201800007
|View full text |Cite
|
Sign up to set email alerts
|

Plasmon‐Enhanced Silicon Nanowire Array‐Based Hybrid Heterojunction Solar Cells

Abstract: In the last decade, freestanding, single crystal silicon nanowires (SiNWs) have attracted significant attention as a potential material for low‐cost optoelectronic devices. In this paper, we demonstrate how strong localized surface plasmon modes, induced using silver nanoparticles, can be used to achieve significant improvement in a simple hybrid organic–inorganic photovoltaic device between n‐type silicon nanowires and poly(3,4‐ethylenedioxythiophene):poly‐(styrenesulfonate) (PEDOT:PSS). At photon energies ab… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

0
16
0

Year Published

2018
2018
2023
2023

Publication Types

Select...
7

Relationship

3
4

Authors

Journals

citations
Cited by 14 publications
(16 citation statements)
references
References 43 publications
0
16
0
Order By: Relevance
“…The immersion lasts 40 minutes at room temperature. After etching, the resulting vertically-aligned nanowire arrays are covered by silver dendrite layer 16 . This residual silver is entirely removed using 70% nitric acid (HNO 3 ) for 1 hour at room temperature 16 .…”
Section: Experimental Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The immersion lasts 40 minutes at room temperature. After etching, the resulting vertically-aligned nanowire arrays are covered by silver dendrite layer 16 . This residual silver is entirely removed using 70% nitric acid (HNO 3 ) for 1 hour at room temperature 16 .…”
Section: Experimental Methodsmentioning
confidence: 99%
“…After etching, the resulting vertically-aligned nanowire arrays are covered by silver dendrite layer 16 . This residual silver is entirely removed using 70% nitric acid (HNO 3 ) for 1 hour at room temperature 16 . Figure 1(a,b) show the top-view and 45° tilted-view SEM micrographs of the final silicon nanowire arrays.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…Metal-assisted wet-chemical etching (MAWCE) of bulk silicon wafers can allow useful all-solution-based mass production of ordered vertically aligned NW arrays over large areas because it permits control over the geometry of their diameter, length, and spacing, while avoiding high-cost and low-output usual lithographic processes. 1113 MAWCE is based on the principles of the galvanic displacement reaction, details of which have been previously discussed. 1416…”
Section: Introductionmentioning
confidence: 99%
“…To date, SiNWs heterojunction devices, such as solar cells and photodetectors, have emerged and be favored over the traditional device architectures due to the low‐cost fabrication method and very low reflectance. [ 5,6,21–23 ] Due to their high surface‐to‐volume ratio and 1D structure, these SiNW‐array‐based devices can offer unique properties compared to their bulk (3D) and thin film (2D) counterparts. For instance, they can offer the following: 1) much larger surface‐to‐volume ratios, thus prolonging the carrier lifetime; [ 24 ] 2) shorter carrier pathways; [ 25 ] and 3) a very effective antireflection behavior.…”
Section: Introductionmentioning
confidence: 99%