2017
DOI: 10.1109/ted.2017.2648500
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Plasmon-Sensitized Optoelectronic Properties of Au Nanoparticle-Assisted Vertically Aligned TiO2 Nanowires by GLAD Technique

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Cited by 19 publications
(4 citation statements)
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“…The porous nature observed from the top view reveals the formation TAT-NWs. Similar morphology is observed from the top view image of GLAD deposited TiO2 NWs [24]. Such nanostructure enhanced the photon absorption due to an increase in the surface-to-volume ratio.…”
Section: Fe-sem Analysissupporting
confidence: 77%
“…The porous nature observed from the top view reveals the formation TAT-NWs. Similar morphology is observed from the top view image of GLAD deposited TiO2 NWs [24]. Such nanostructure enhanced the photon absorption due to an increase in the surface-to-volume ratio.…”
Section: Fe-sem Analysissupporting
confidence: 77%
“…The junction formed between the Ag NPs and the semiconductor can assist the separation of photogenerated charge carriers along with efficient charge carrier transfer mechanism that can further result in increased photocurrents and superior performance of photoelectronic devices. Till now, numerous metal oxide-based nanostructures using TiO 2 , ZnO and SiO 2 have already been synthesized with noble metal NPs for photodetector applications [27][28][29]. In spite of these, so far, the use of Ag NPs on 1D CeO 2 nanostructures has not been reported for photodetector application.…”
Section: Introductionmentioning
confidence: 99%
“…Obviously, after the plasma treatment process, a decrease of the bandgap can be found, which could be attributed to the deep-level defects (oxygen vacancies) induced by the plasma treatment. [25] When the materials were used as catalysts for NRR reaction, the improved performances are related to the formed oxygen vacancies (or Ti 3þ species) and disordered surface layer in the hydrogenated TiO 2 . The high-resolution transmission electron microscopy (HRTEM) images of the three samples are shown in Figure 2.…”
Section: Characterizations and Discussionmentioning
confidence: 99%