1988
DOI: 10.1063/1.100344
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Plateau and kink in P profiles diffused into Si: A result of strong bimolecular recombination?

Abstract: A simplified five-species nonequilibrium kinetic model for phosphorus diffusion in silicon is presented. The resulting system of evolution equations is of a simple reaction-diffusion form with constant diffusivities. Using first-order thermodynamic estimates for reaction rates, the phosphorus profile after a 10 min predeposition shows the expected tail. However, only when the bimolecular generation-recombination rate is significantly increased does a kink-plateau result. This suggests that recombination may be… Show more

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Cited by 27 publications
(15 citation statements)
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“…and the initial data satisfy these boundary conditions, then the solutions are bounded in where Ω is an unbounded domain such as a half-space as considered in [9,10]. The proofs can be modifed using the interior estimate ideas in [4].…”
Section: Examples and Concluding Remarksmentioning
confidence: 99%
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“…and the initial data satisfy these boundary conditions, then the solutions are bounded in where Ω is an unbounded domain such as a half-space as considered in [9,10]. The proofs can be modifed using the interior estimate ideas in [4].…”
Section: Examples and Concluding Remarksmentioning
confidence: 99%
“…For more information on the physics, we refer the interested reader to [9] and the references therein. These reactions lead to the reaction-diffusion system (1.1)…”
Section: Introductionmentioning
confidence: 99%
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“…In [13,5] the diffusion coefficient d5 is taken to be zero, reflecting the assumption that the only significant transport mechanism for phosphorus is the combination with the vacancies and interstitials; however, for our purposes here, we will assume d5> 0 in analogy with the idea of artificial viscosity. Of physical interest for this model (cf.…”
mentioning
confidence: 99%