Platinum OMCVD processes and precursor chemistry

Thurier, C.; Doppelt, P.

doi:10.1016/j.ccr.2007.04.005

Cited by 66 publications

(75 citation statements)

References 78 publications

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“…This fact alone suggests that the dissociation pathways behind CVD and EBID are fundamentally different and hence techniques which are applicable in one area are likely not relevant in the other. One reference to a comprehensive review of platinum deposition from CVD is nonetheless provided [100] for the interested reader; the effects of mixing of H 2 , O 2 and other gases are covered therein.…”

Section: Related Techniquesmentioning

confidence: 99%

Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective

Mulders²,

2009

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The creation of functional nanostructures by electron-beam-induced deposition (EBID) is becoming more widespread. The benefits of the technology include fast 'point-and-shoot' creation of three-dimensional nanostructures at predefined locations directly within a scanning electron microscope. One significant drawback to date has been the low purity level of the deposition. This has two independent causes: (1) partial or incomplete decomposition of the precursor molecule and (2) contamination from the residual chamber gas. This frequently limits the functionality of the structure, hence it is desirable to improve the decomposition and prevent the inclusion of contaminants. In this contribution we review and compare for the first time all the techniques specifically aimed at purifying the as-deposited impure EBID structures. Despite incomplete and scattered data, we observe some general trends: application of heat (during or after deposition) is usually beneficial to some extent; working in a favorable residual gas (ultra-high vacuum set-ups or plasma cleaning the chamber) is highly recommended; gas mixing approaches are extremely variable and not always reproducible between research groups; and carbon-free precursors are promising but tend to result in oxygen being the contaminant species rather than carbon. Finally we highlight a few novel approaches.

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Section: Related Techniquesmentioning

confidence: 99%

Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective

Mulders²,

2009

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“…Trimethyl(methylcyclopentadienyl)platinum(IV), commonly referred to as MeCpPtMe 3 (Abcr) is widely used ( [8,9,[13][14][15]), relatively volatile ( [16]), and rather expensive. The iron precursor Ethylferrocene (EF) (Abcr) is relatively affordable and volatile [17].…”

Section: Cvd Precursorsmentioning

confidence: 99%

On the Activity Enhancing Role of Iron Oxide for Noble Metal Oxidation Catalysts: A CVD-Based Study with Differently Structured Combinations of Pt and FeOx Coatings on Al2O3

et al. 2018

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Abstract:With regard to the catalysis of oxidation reactions by noble metals, the addition of FeO x to an Al 2 O 3 -supported Pt catalyst is known to be energetically more favorable compared to only Pt. In this work, different process routes for the preparation of such Fe-promoted Pt/Al 2 O 3 catalysts via atmospheric chemical vapor deposition (CVD) in a fluidized bed were explored. Specifically, the question of whether it would be advantageous to deposit the Fe before, along with, or after the Pt was addressed, and new information was obtained about the optimum FeO x -Pt interface and mixing ratio. Vapors of Trimethyl(methylcyclopentadienyl)platinum(IV) and/or Ethyl-ferrocene were injected into the bed from the top, permitting a quasi-lossless precursor operation and a very good control of the deposited metal, and hence of the catalyst structure. Samples could be extracted from the top while CVD was ongoing to obtain time-resolved data. The catalytic activity was determined through CO oxidation. The Fe-Pt mixing ratio was then varied for the most active deposition sequence, in order to identify an activity optimum generated by the minimum amount of Pt catalyst. When compared to pure Pt/Al 2 O 3 , the optimum catalyst consistently showed superior performance even after thermal stress.

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“…The choice of MOCVD precursor that should satisfy several requirements as adequate volatility, thermal stability in the solid and gas phase, nontoxic, stable in the air, and possibility to synthesize compounds with high yields from available reagents without using special synthetic apparatus, affects the growth process and characteristics of Pt films. There are some platinum precursors such as Me 3 Pt R Cp [8][9][10] ( R Cp is cyclopentadienyl or its derivatives, namely, methylcyclopentadienyl ( Me Cp), ethylcyclopentadienyl ( Et Cp)), Pt(acac) 2 (acac = acetylacetonate) [8,11], Pt(hfac) 2 , (hfac = hexafluoroacetylacetonate) [8,12], Me 2 Pt( R COD) [13,14] ( R COD is 1,5-cyclooctadiene or its alkyl derivatives), Pt(PF 3 ) 4 [8,15], however, each of them has some drawbacks restricting its wide MOCVD application. For this reason, the search of novel precursors is still one of the actual problems in MOCVD technology.…”

Section: Introductionmentioning

confidence: 99%

“…Platium(II) β-diketonates and their derivatives are often used as precursors in MOCVD technique, whereas platinum(IV) β-diketonate derivatives are not practically regarded as MOCVD precursors. In fact, until now only [(CH 3 ) 3 Pt(acac)] 2 was used in MOCVD [8].…”

Section: Introductionmentioning

confidence: 99%

MOCVD growth of Pt films using a novel Pt(IV) compound as a precursor

Dorovskikh

Zharkova

Зеленина

et al. 2015

Phys. Status Solidi C

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The Me3Pt(acac)Py compound, trimethyl(pentane‐2,4‐dionato)platinum(IV)pyridine, is synthesized and, for the first time, characterized by physico‐chemical methods to determine its chemical composition (elemental analysis, IR‐spectroscopy) and thermal behavior (thermogravimetric (TG), differential thermal analyses (DTA), differential scanning calorimetry (DSC), tensometric flow method). Due to its good volatility ln(p/p°) = 16.47–9699/T(K) at moderate temperatures (393–414 K) the compound is offered as a promising precursor for growth of Pt films by metal‐organic chemical vapour deposition (MOCVD). The Pt films deposited on various substrates including Si(100), Ta, Ti substrates, cathodes and anodes of the electrodes for pacemakers are investigated by X‐ray diffraction (XRD), scanning electron microscopy (SEM) and X‐ray photoelectron spectroscopy (XPS). The electrochemical characteristics of Pt films are also determined. (© 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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Platinum OMCVD processes and precursor chemistry

Cited by 66 publications

References 78 publications

Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective

Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective

On the Activity Enhancing Role of Iron Oxide for Noble Metal Oxidation Catalysts: A CVD-Based Study with Differently Structured Combinations of Pt and FeOx Coatings on Al2O3

MOCVD growth of Pt films using a novel Pt(IV) compound as a precursor

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