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Sweeping is a purification process that removes certain impurities and thereby improves the radiation sensitivity of quartz crystals. It is an electric field driven, high-temperature, solid-state diffusion process. The major steps of a typical sweeping process consist of: applying electrodesto the Z-surfacesof a lumberedquartz bar; applying voltage to the electrodesto produce an electricfield of approximately 1 kV/cm; heating the bar slowly either in air, vacuum, or in hydrogen containing or inert atmospheres to about 5 0 0 ' C; monitoring the current through the bar (as sweepingprogresses,the current decreases); when the current decays to some near-constant value, cooling the bar slowly to room temperature,and removing the voltage.Alkali-metal impurities, such as Li+ and Na' , are charge compensators for trivalent aluminum impurities in quartz. When sweeping is performed in air or H2, the alkalis diffuseto the cathode and are replaced by the indiffusion of hydrogen at the anode. The alkali-metal impurities are subsequently removed by lapping the Zsurfaces. The sweeping process also modifiesdislocations, reducing the tendencyfor formation of etch channels.Recent advances have involved the use of impurity characterizations, such as: electron spin resonance (ESR); acoustic loss measurements;and infrared absorption spectroscopy (IR). Future directions for technology enhancementwill probably involve: developmentof methodsto control theelectrode-quartz-gasinterface; use of H+ ion implantation techniquqand UV-stimulatedsweeping.
Sweeping is a purification process that removes certain impurities and thereby improves the radiation sensitivity of quartz crystals. It is an electric field driven, high-temperature, solid-state diffusion process. The major steps of a typical sweeping process consist of: applying electrodesto the Z-surfacesof a lumberedquartz bar; applying voltage to the electrodesto produce an electricfield of approximately 1 kV/cm; heating the bar slowly either in air, vacuum, or in hydrogen containing or inert atmospheres to about 5 0 0 ' C; monitoring the current through the bar (as sweepingprogresses,the current decreases); when the current decays to some near-constant value, cooling the bar slowly to room temperature,and removing the voltage.Alkali-metal impurities, such as Li+ and Na' , are charge compensators for trivalent aluminum impurities in quartz. When sweeping is performed in air or H2, the alkalis diffuseto the cathode and are replaced by the indiffusion of hydrogen at the anode. The alkali-metal impurities are subsequently removed by lapping the Zsurfaces. The sweeping process also modifiesdislocations, reducing the tendencyfor formation of etch channels.Recent advances have involved the use of impurity characterizations, such as: electron spin resonance (ESR); acoustic loss measurements;and infrared absorption spectroscopy (IR). Future directions for technology enhancementwill probably involve: developmentof methodsto control theelectrode-quartz-gasinterface; use of H+ ion implantation techniquqand UV-stimulatedsweeping.
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