2012
DOI: 10.1134/s1063782612010186
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Polarization dependences of electroluminescence and absorption of vertically correlated InAs/GaAs QDs

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Cited by 4 publications
(5 citation statements)
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“…Laser structures were grown by molecular beam epitaxy on n + -GaAs (001) substrate and are similar to the structure described in [6,8]. The structure consisted of an n -doped bottom Al 0.35  Ga 0.75 As layer with a thickness of 1.5 μm, a waveguide undoped GaAs layer with a thickness of 480 nm containing ten layers of In(Ga)As QD, a p -doped upper Al 0.35  Ga 0.75 As layer with a thickness of 1.5 μm, and a p + -doped contact GaAs layer.…”
Section: Methodsmentioning
confidence: 99%
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“…Laser structures were grown by molecular beam epitaxy on n + -GaAs (001) substrate and are similar to the structure described in [6,8]. The structure consisted of an n -doped bottom Al 0.35  Ga 0.75 As layer with a thickness of 1.5 μm, a waveguide undoped GaAs layer with a thickness of 480 nm containing ten layers of In(Ga)As QD, a p -doped upper Al 0.35  Ga 0.75 As layer with a thickness of 1.5 μm, and a p + -doped contact GaAs layer.…”
Section: Methodsmentioning
confidence: 99%
“…The refractive index of the upper and lower Al 0.35  Ga 0.75 As layers differed from that of the central layer, which confined light within the central part of the undoped SLQD-containing region. The vertical alignment of QDs was observed by transmission electron microscopy (see Figure 1) [6,8] .…”
Section: Methodsmentioning
confidence: 99%
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