We demonstrate theoretically that interface engineering can drive Germanium, one of the most commonly-used semiconductors, into topological insulating phase. Utilizing giant electric fields generated by charge accumulation at GaAs/Ge/GaAs opposite semiconductor interfaces and band folding, the new design can reduce the sizable gap in Ge and induce large spin-orbit interaction, which lead to a topological insulator transition. Our work provides a new method on realizing TI in commonly-used semiconductors and suggests a promising approach to integrate it in well developed semiconductor electronic devices.PACS numbers: 71.70. Ej, 75.76.+j, 72.25.Mk Time-reversal invariant topological insulators (TIs) have aroused intensive interests in the past years, with tantalizing properties such as insulating bulk, robust metallic edge or surface modes and exotic topological excitations, and potential applications ranging from spintronics to quantum computation. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15] Despite these successful progresses, the topological insulator materials are still limited in the narrow gap materials containing heavy atoms, e.g., HgTe, [4,5] Bi 2 X 3 (X=Se, Te,...) [8][9][10][11], transition metal oxide heterostructure [16] and Heusler compounds [12,17]. These materials are often very different from conventional semiconductor materials in structures and properties and are hard to be integrated in current electronics devices that are based on well developed semiconductor fabrication technologies.Although there are theoretical predicts about realizing TI states in graphene, [3,18,19] the main obstacle is the weak intrinsic spin-orbit interaction (SOI) of carbon atoms. Here, instead of searching new TI materials with exotic structures and chemical elements, we take a totally different route: driving the commonly used semiconductors into TI states by using the intrinsic electric field and the strains. The difficulty of this approach lies in the fact that most of the commonly used semiconductors, such as Si, Ge, GaAs and many others usually possess sizable band gaps and do not have strong enough SOI. Furthermore, group IV elements such as Si and Ge have indirect band gap, posing extra difficulty in realizing TI. Inspired by recent theoretical works that the normal insulator [20] can be driven into a TI by an external electric field, our approach is to impose huge electric field by deliberately designed heterostructures. Recently, an interesting way of realizing topological insulating phase in a p-type GaAs quantum well by two-dimentional superimposed potentials with hexagonal symmetry was proposed.[21] Different to that work, our approach rely completely on the material engineering at the atomic level.Since commonly-used semiconductors, e.g., Si, Ge, GaAs, posses sizable bandgap ranging from 0.8eV to 1.4eV, a huge electric field is required to closing bandgap and even invert the conduction and valence bands. Such huge electric field can not be generated utilizing the gate technique. However, recent ...