The microstructure
of the PbZr
0.52
Ti
0.48
O
3
(PZT) films
is known to influence the ferroelectric properties,
but so far mainly the effect of the deposition conditions of the PZT
has been investigated. To our knowledge, the influence of the underlying
electrode layer and the mechanisms leading to changes in the PZT microstructure
have not been explored. Using LaNiO
3
(LNO) as the bottom
electrode material, we investigated the evolution of the PZT microstructure
and ferroelectric properties for changing LNO pulsed-laser deposition
conditions. The explored deposition conditions were the O
2
pressure, total pressure, and thickness of the electrode layer.
Increasing both the O
2
pressure and the thickness of the
electrode layer changes the growth of PZT from a smooth, dense film
to a rough, columnar film. We explain the origin of the change in
PZT microstructure as the increased roughness of the electrode layer
in relaxing the misfit strain. The strain relaxation mechanism is
evidenced by the increase in the crystal phase with bulk LNO unit
cell dimensions in comparison to the crystal phase with substrate-clamped
unit cell dimensions. We explain the change from a dense to a columnar
microstructure as a result of the change in the growth mode from Frank–van
der Merwe to Stranski–Krastanov. The ferroelectric properties
of the columnar films are improved compared to those of the smooth,
dense films. The ability to tune the ferroelectric properties with
the microstructure is primarily relevant for ferroelectric applications
such as actuators and systems for energy harvesting and storage.