2016
DOI: 10.1016/j.precisioneng.2015.06.014
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Polishing characteristics and mechanism in magnetorheological planarization using a permanent magnetic yoke with translational movement

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Cited by 30 publications
(3 citation statements)
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“…Furthermore, Li et al [ 28 ] established the MRR for a shear thickening polishing (STP) based on the Preston equation, fluid dynamics and shear thickening mechanism. Wang et al [ 29 ] constructed the MRR model by using the tangential force and normal force on the workpiece and concluded that the removal effect during the MRP process was more dominant by the tangential force on the workpiece.…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, Li et al [ 28 ] established the MRR for a shear thickening polishing (STP) based on the Preston equation, fluid dynamics and shear thickening mechanism. Wang et al [ 29 ] constructed the MRR model by using the tangential force and normal force on the workpiece and concluded that the removal effect during the MRP process was more dominant by the tangential force on the workpiece.…”
Section: Introductionmentioning
confidence: 99%
“…Friction induced temperature generation at the cutting zone also affects the surface roughness 17) . Lowering surface roughness or enhancing surface quality had been a prime aim of many researchers [18][19][20][21][22] . These difficulties serve as a motivation to do more research on the micromilling process and enhance it, specifically on its advanced application and machining of difficult-to-cut materials.…”
Section: Introductionmentioning
confidence: 99%
“…Continuous efforts have been made on the MRF process, but most investigations focused on the optics materials [14][15][16][17]. The flatness has been improved largely with the optimization of the MRF process on the workpiece with strong stiffness, such as potassium dihydrogen phosphate (KDP) crystal, quartz glass and so on [18][19][20]. Furthermore, some models have been established to predict the material removal rate on the optical component surface [21,22].…”
Section: Introductionmentioning
confidence: 99%