Polishing, preparation and patterning of diamond for device applications

Hicks, Marie-Laure; Pakpour‐Tabrizi, Alexander C.; Jackman, Richard B.

doi:10.1016/j.diamond.2019.05.010

Cited by 46 publications

(26 citation statements)

References 82 publications

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“…A comprehensive review on the phenomenon of micromasking and methods of dealing with it can be found in the previous study. [ 34 ]…”

Section: Resultsmentioning

confidence: 99%

“…A comprehensive review on the phenomenon of micromasking and methods of dealing with it can be found in the previous study. [34] Micromasking "grass" was observed after RIE of diamond with Al, SiO 2 , Si 3 N 4 , and other hardmasks. [13,31,33] To suppress the formation of "grass," the small addition of heavy fluorineforming gases, such as CF 4 [31] or SF 6 , [33] to the plasma is often used (in this work, after RIE of diamond substrates in SF 6 -based plasma, micromasking was also not observed).…”

Section: Diamond Microstructures Fabricationmentioning

confidence: 99%

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Two‐Step Reactive Ion Etching Process for Diamond‐Based Nanophotonics Structure Formation

Голованов

Luparev

Troschiev

et al. 2020

Physica Status Solidi (a)

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Diamond surface modification is one of the most important technological challenges in the creation of diamond quantum photonics devices. It is necessary to fabricate different 3D structures on the crystal surface with both vertical and V‐shaped etching grooves for waveguides, grating couplers, and mesastructures. Herein, the applicability of SF6‐based plasma for diamond processing is studied. SF6 plasma etches diamond five times faster than commonly used Ar/O2 3:1 at the same pressure and bias, but it cannot provide vertical diamond structures due to the ion scattering. Herein, the two‐step plasma processing method is developed with Molybdenum protective masks that provide steep diamond 3D structures with sidewall roughness less than 40 nm and is, therefore, suitable for nanophotonics and other diamond applications. Mo can be chemically patterned by low‐power SF6 plasma and then used as a hardmask for anisotropic etching of diamond in Ar/O2 plasma with a selectivity of 27. Unlike common methods of diamond processing, the proposed two‐step method does not require chlorine.

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“…A comprehensive review on the phenomenon of micromasking and methods of dealing with it can be found in the previous study. [ 34 ]…”

Section: Resultsmentioning

confidence: 99%

Section: Diamond Microstructures Fabricationmentioning

confidence: 99%

Two‐Step Reactive Ion Etching Process for Diamond‐Based Nanophotonics Structure Formation

Голованов

Luparev

Troschiev

et al. 2020

Physica Status Solidi (a)

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“…Until recently, the most complex in this process was the coating polishing operation. Due to the high hardness of the coating, the existing methods of grinding and finishing [1][2][3][4] did not provide the required surface roughness, which should be Ra 0.04 and at which the graphite particle and all other coating particles with poor adhesion are removed. Therefore, they are replaced by other methods, the most promising of which is the method of thermochemical treatment [5][6][7][8].…”

Section: Methodsmentioning

confidence: 99%

New material for anti-wear corrosion-resistant coating of agro industrial complex machinery parts

Okhlupin¹,

Королев

Sinev

2020

E3S Web of Conf.

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The article presents the results of an experimental study of the corrosion resistance of the ta-C double coating of parts by PVD method with intermediate and final surface polishing with a discrete tool. The influence of regime factors on the results of polishing the ta-C coating with a discrete tool is shown, and optimal processing modes are proposed. Tests of samples in a salt bath showed that the double ta-C coating by PVD method with intermediate and final polishing ensures the absence of corrosion and coating peeling

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“…Since as-grown or laser-cut diamond substrates present significant surface roughness [29,30], polishing is indispensable before further micro-and nanofabrication processing. Diamond polishing is performed either mechanically or via contactless etching, typically reactive ion etching or ion beam etching with inert-gas ions, or in a combination of both [31,32].…”

Section: Diamond Substrates and Materials Propertiesmentioning

confidence: 99%

Diamond diffractive optics—recent progress and perspectives

Kiss

Huszka

et al. 2020

Advanced Optical Technologies

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Diamond is an exceptional material that has recently seen a remarkable increase in interest in academic research and engineering since high-quality substrates became commercially available and affordable. Exploiting the high refractive index, hardness, laser-induced damage threshold, thermal conductivity and chemical resistance, an abundance of applications incorporating ever higher-performance diamond devices has seen steady growth. Among these, diffractive optical elements stand out—with progress in fabrication technologies, micro- and nanofabrication techniques have enabled the creation of gratings and diffractive optical elements with outstanding properties. Research activities in this field have further been spurred by the unique property of diamond to be able to host optically active atom scale defects in the crystal lattice. Such color centers allow generation and manipulation of individual photons, which has contributed to accelerated developments in engineering of novel quantum applications in diamond, with diffractive optical elements amidst critical components for larger-scale systems. This review collects recent examples of diffractive optical devices in diamond, and highlights the advances in manufacturing of such devices using micro- and nanofabrication techniques, in contrast to more traditional methods, and avenues to explore diamond diffractive optical elements for emerging and future applications are put in perspective.

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Polishing, preparation and patterning of diamond for device applications

Cited by 46 publications

References 82 publications

Two‐Step Reactive Ion Etching Process for Diamond‐Based Nanophotonics Structure Formation

Two‐Step Reactive Ion Etching Process for Diamond‐Based Nanophotonics Structure Formation

New material for anti-wear corrosion-resistant coating of agro industrial complex machinery parts

Diamond diffractive optics—recent progress and perspectives

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