Polishing trajectory planning method for optimal removal of full surface

Abstract

Optical free-form surface elements have better optical characteristics than traditional optical elements, but their more complex curved structure also increases the difficulty of optical processing. Aiming at the problem of insufficient equal overlap ratio spirals, this paper proposes a polishing trajectory planning method for the optimal removal of the full surface. Based on the overlap length model of the curvature change, the polishing area, track residence time and total material removal model are established, and the processing efficiency is determined. The projection method is used to map the spatial polishing trajectory to the plane, and the mathematical relationship between the material removal amount and the trajectory spacing of the circular polishing and the projection trajectory spacing is established. This paper analyzes the influence of contact area change, geodesic radius of curvature and polishing posture on the material removal of the curved surface, as well as the change trend of the material removal contour and the contour of the overlapping part. Finally, taking the rotationally symmetrical aspherical workpiece made of K9 glass as an example, the corresponding polishing plan is formulated to verify the effectiveness of the proposed method.