The electrical characteristics of a transistor on a transferred silicon ribbon are demonstrated. The process temperature is limited to 200°C for potential use on plastic sheets. Additional hydrogen annealing reduces the threshold voltage and improves the transistor properties. A high mobility of around 160 cm 2 /V s, with a high on/off ratio and an off current of as low as Ͻ10 11 A, is achieved. The flexibility of the device is evaluated after applying stress in the bended condition. The device shows very little change in properties with a bending radius Ͻ4 mm. Overall, good electrical and mechanical properties are demonstrated for future use on flexible device applications.Electronic devices on a flexible plastic substrate soon have a market potential in the form of flexible displays, radio frequency identification tags, solar cells, and various biosystems. 1,2 Many organic semiconductors, 3,4 oxide semiconductors, 5,6 and amorphous and polysilicon 7,8 have been used as an active semiconductor layer for a flexible device application. But due to their intrinsic limitations, it is not possible to obtain high performance devices. Hence, there is no alternative but to use a single-crystal semiconductor as an active layer. Mietl et al., 9 Menard et al.,10 and Ahn et al. 11 developed a transfer technique where after the doping process, a single crystalline silicon active layer can be transferred onto the plastic sheet from the silicon-on-insulator ͑SOI͒ wafers, which is quite attractive for a high performance transistor.The dielectric grown at low temperatures on the plastic sheets contains many defect sites and interface dangling bonds. 12,13 To improve the device properties, successful defect passivation is absolutely necessary. Hydrogen ͑H 2 ͒ passivates the defect sites far more effectively, especially near the interface region. 14,15 Some studies also show effective passivation even at relatively lower temperatures. [16][17][18] In this study, transistor properties with an aluminum oxide ͑Al 2 O 3 ͒ gate dielectric and platinum ͑Pt͒ as a gate electrode are presented. Properties in the bended condition are also reported.After defining the doping region on the SOI wafer, the phosphorous spin-on-dopant ͑P509͒ was used for convenience. 19 The doping concentration was measured to be 2 ϫ 10 18 cm −3 after activation annealing at 950°C. After etching the underneath SiO 2 layer, 290 nm of the top Si layer can be transferred onto the polyimide ͑PI͒ sheet via the poly͑dimethylsiloxane͒ stamping process. A detailed transfer process has been described elsewhere. 11 After the transfer process, Al 2 O 3 was deposited as a gate dielectric in a plasmaenhanced atomic layer deposition chamber at 200°C. The thickness of the dielectric was ϳ77 nm and that of the dielectric constant was 7.8 nm. After the source-drain gate patterning, platinum of ϳ100 nm thickness was deposited as an electrode, and a lift-off process was adopted. Figure 1a shows the schematic cross-sectional view of the top-gate device structure on the PI sheet. The d...